Formula of matsutake soothing and repairing mask and preparation method thereof

A formula and facial mask technology, applied to medical preparations containing active ingredients, pharmaceutical formulas, cosmetic preparations, etc., can solve the problems of affecting physical and mental health, indiscriminate use of cosmetics, single effect, etc., to prevent the loss of skin elasticity and good anti-oxidation , significant effect

Pending Publication Date: 2021-12-14
陕西澳美娅生物科技有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Today, sensitive skin is becoming more and more common, partly due to environmental pollution, partly due to the indiscriminate use of cosmetics, and partly due to the increase in life pressure, irregular work and rest, and skin allergies seriously affect people's physical and mental health. Most facial masks contain various harmful additives, such as hormones, heavy metals, fluorescent agents, etc. After use, some people's skin will be irritated, causing discomfort, and the effect is single

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Formula of matsutake soothing and repairing mask and preparation method thereof
  • Formula of matsutake soothing and repairing mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Soothing repair mask formulation and method of preparation Example 1 A embodiment Matsutake, comprising:

[0025] I. A solution was prepared

[0026] Add deionized water to the reaction section A kettle, heated 70-80 ℃ preheating, panthenol were added 0.01%, 0.01% dipotassium glycyrrhizinate, ergothioneine 0.5%, glutathione 0.001%, palmitoyl hexapeptide -12 0.001%, palmitoyl dipeptide -70.001%, 0.01% yeast polypeptides, cetearyl ester 0.01% olive oil, olive oil, sorbitan esters 0.001%, 0.01% Bacillus fermentation product, stirring in speed under stirring 100-150r / min of 10-15min, to obtain a solution A.

[0027] Second, the solution B was prepared

[0028] Add part deionized water to reactor B, heated 70-80 ℃ preheating, skin conditioning agents added 0.1%, the stirring speed was stirred under 100-150r / min, conditions 10-15min, to obtain a solution B.

[0029] Third, the mask preparation dope

[0030] The solution A and solution B was added to a stirred tank, added sequ...

Embodiment 2

[0031] Soothing mask repair recipe and preparation method of Example 2 matsutake one kind of embodiment, comprising:

[0032] I. A solution was prepared

[0033] Add deionized water to the reaction section A kettle, heated 70-80 ℃ preheating, panthenol were added sequentially 0.1%, 0.2% dipotassium glycyrrhizinate, ergothioneine 1.5%, 0.02% glutathione, palmitoyl hexapeptide -12 0.02% -70.02% palmitoyl dipeptide, 0.2% yeast polypeptides, cetearyl ester 0.2% olive oil, sorbitan ester of olive oil 0.02%, 0.2% Bacillus fermentation product, stirring in speed under stirring 100-150r / min of 10-15min, to obtain a solution A.

[0034] Second, the solution B was prepared

[0035]The addition of partial deionized water to the reaction kettle B, warmed by heating 70-80 ° C, adding 0.5% of the skin conditioner, stirring at a stirring speed of 100-150 r / min, stirring 10-15 min, and preparing solution B.

[0036] Third, the preparation of the mask

[0037] The solution A and solution B wer...

Embodiment 3

[0038] Example 3 A formula and preparation method thereof, including:

[0039] First, the solution A preparation

[0040] Add partial deionized water to the reactor A, warming up 70-80 ° C for preheating, add 0.5% pantonol, 0.1% dipotassium glycyrrhizic acid, 1% of wheat angiomethosis, 0.01% glutathione, Palmita -12 0.01%, Palm Totylettrymonide-70.01%, yeast polypeptide 0.1%, 5.1% of cethanol olive olerates, yam pear tama olive olerates 0.01%, Bacillus fermentation product 0.1%, stirring The mixture was stirred at a speed of 100-150 r / min for 10-15 min, and the solution A was obtained.

[0041] Second, the solution B was prepared

[0042] In the addition of partial deionized water to the reaction kettle B, heating 70-80 ° C for preheating, adding a skin conditioner to 0.29%, stirring at a stirring speed of 100-150 r / min, stirring 10-15 min, preparing solution B.

[0043] Third, the preparation of the mask

[0044] The solution A and solution B were added to the stirred tank, s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the field of masks, in particular to a formula of a matsutake soothing and repairing mask and a preparation method thereof. The formula comprises panthenol, dipotassium glycyrrhizinate, ergothioneine, glutathione, palmitoyl hexapeptide-12, palmitoyl dipeptide-7, yeast polypeptides, cetearyl olivate, sorbitan olivate, a bacillus fermentation product skin conditioner, a humectant, a thickening agent and an antioxidant. According to the formula and the preparation method of the matsutake soothing and repairing mask, the added skin conditioner is natural plant essence and has the effects of efficiently resisting oxidation, delaying senescence, preventing age-related skin elasticity loss and modifying and improving the facial contour; and in the added antioxidant, lecithin has the effects of moisturizing and resisting oxidation, the skin regeneration activity can be guaranteed by adding the component into the cosmetic, and the component has good hydrophilicity and lipophilicity, so that the skin gloss can be increased after the cosmetic is used.

Description

technical field [0001] The invention relates to the field of facial masks, in particular to a formula of matsutake soothing and repairing facial mask and a preparation method thereof. Background technique [0002] Mask is a beauty and skin care product that is applied to the face. The mask uses the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, and make the skin oxygenated. The increase in water content is beneficial to the skin to eliminate the products of epidermal cell metabolism and accumulated oily substances. The water in the mask penetrates into the stratum corneum of the epidermis, making the skin soft and naturally bright and elastic. Now the mask has become a must for many beauty-loving women. Choose one of the skin care products; [0003] Today, sensitive skin is becoming more and more common, partly due t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9728A61K8/9789A61K8/92A61K8/55A61K8/44A61K8/34A61K8/73A61Q19/08A61Q19/00A61Q19/02
CPCA61K8/9728A61K8/9789A61K8/922A61K8/553A61K8/44A61K8/345A61K8/735A61K8/731A61Q19/08A61Q19/00A61Q19/02A61K2800/48
Inventor 马魁
Owner 陕西澳美娅生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products