Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Skin care composition capable of resisting light pollution and light damage as well as preparation method and application of skin care composition

A skin care composition and light damage technology, applied in the field of skin care products, can solve the problems of single function of skin care products, anti-light pollution, etc., and achieve the effect of accelerating cell repair, reducing free radical content, and improving anti-light pollution

Pending Publication Date: 2021-12-31
广州万邦实业发展有限公司
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Aiming at the problems in the prior art, the present invention provides a skin care composition that resists light pollution and light damage, which solves the problem of single function of skin care products, uses a filter composition to form a light filter system, and a barrier protection composition to form a surface protective film system, the two cooperate to achieve protection-filtering integrated protection on the skin surface, supplemented by the cell repair composition to form a healing effect on skin cells, form a self-activation system from the cell level, and achieve an integrated self-repair-protection system inside and outside the cell, Greatly improved the effect of anti-light pollution and anti-light damage

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Skin care composition capable of resisting light pollution and light damage as well as preparation method and application of skin care composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] A skin care composition for resisting light pollution and light damage, the quality ratio of which is as follows:

[0038] 20g of filter composition, 10g of cell repair composition, 20g of barrier protection composition, and 20g of glycerol-water mixture.

[0039] The light filtering protective composition comprises bark bark extract, alfalfa extract and inorganic materials, the mass ratio of bark bark extract, alfalfa extract and inorganic materials is 1:2:1, and the inorganic materials The material is titanium dioxide.

[0040] The cell repair composition comprises ergothioneine, panthenol and allantoin; the mass ratio of the ergothioneine, panthenol and allantoin is 1:3:2.

[0041] The barrier protection composition comprises tetrahydromethylpyrimidine carboxylic acid, white willow bark extract, rice bran extract and yeast dextran, and the tetrahydromethylpyrimidine carboxylic acid, white willow bark extract, rice bran extract and The mass ratio of yeast glucan is ...

Embodiment 2

[0048] A skin care composition for resisting light pollution and light damage, the quality ratio of which is as follows:

[0049] Filter composition 40g, cell repair composition 30g, barrier protection composition 40g, glycerol water mixture 60g.

[0050] The light filtering protective composition comprises bark bark extract, alfalfa extract and inorganic materials, the mass ratio of bark bark extract, alfalfa extract and inorganic materials is 1:4:2, and the inorganic materials The material is zinc oxide.

[0051] The cell repair composition comprises ergothioneine, panthenol and allantoin; the mass ratio of the ergothioneine, panthenol and allantoin is 1:5:3.

[0052] The barrier protection composition comprises tetrahydromethylpyrimidine carboxylic acid, white willow bark extract, rice bran extract and yeast dextran, and the tetrahydromethylpyrimidine carboxylic acid, white willow bark extract, rice bran extract and The mass ratio of yeast glucan is 2:3:4:5. The preparat...

Embodiment 3

[0059] A skin care composition for resisting light pollution and light damage, the quality ratio of which is as follows:

[0060] 30g of filter composition, 20g of cell repair composition, 30g of barrier protection composition, 40g of glycerol-water mixture.

[0061] The light filtering protective composition comprises bark bark extract, alfalfa extract and inorganic materials, the mass ratio of bark bark extract, alfalfa extract and inorganic materials is 1:3:1, and the inorganic materials The material is titanium dioxide.

[0062] The cell repair composition comprises ergothioneine, panthenol and allantoin; the mass ratio of the ergothioneine, panthenol and allantoin is 1:4:2.

[0063] The barrier protection composition comprises tetrahydromethylpyrimidine carboxylic acid, white willow bark extract, rice bran extract and yeast dextran, and the tetrahydromethylpyrimidine carboxylic acid, white willow bark extract, rice bran extract and The mass ratio of yeast glucan is 2:2:...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of skin care products and particularly relates to a skin care composition capable of resisting light pollution and light damage. The skin care composition is prepared from the following components in parts by mass: 20 to 40 parts of a light filtering composition, 10 to 30 parts of a cell repairing composition, 20 to 40 parts of a barrier protection composition and 20 to 60 parts of a glycerol water mixture. The invention provides a corresponding preparation method and application. By adopting the skin care composition provided by the invention, the problem that the function of the skin care products is single is solved; the light filtering composition is used for forming a light filtering system and the barrier protection composition is used for forming a surface-layer protection film system; the light filtering system and the barrier protection composition are matched on the surface of skin to realize protection-filtering integrated protection; the cell repairing composition is used for forming a healing effect on skin cells and a self-activation system is formed from a cell level, so that an integrated self-repairing-protection system inside and outside the cells is realized and the effects of resisting the light pollution and the light damage are greatly improved.

Description

technical field [0001] The invention belongs to the technical field of skin care products, and in particular relates to a skin care composition for resisting light pollution and light damage, a preparation method and application thereof. Background technique [0002] Light pollution is a phenomenon in which excessive or inappropriate light radiation produced by modern society has adverse effects on human life and production environment. The damage of ultraviolet rays and blue light to human skin has also attracted more and more attention. Ultraviolet rays and blue light will cause skin cells to produce too much active oxygen, and the degree of oxidation in the body exceeds the removal rate of oxides. The imbalance between oxidation and antioxidant systems Excessive reactive oxygen species oppress cells, causing DNA damage, lipid peroxidation, collagen structure damage and mitochondrial function damage. These damages may eventually cause skin problems or skin diseases such a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/27A61K8/29A61K8/34A61K8/42A61K8/49A61K8/73A61Q5/02A61Q5/12A61Q17/04A61Q19/00A61Q19/08
CPCA61K8/9794A61K8/9789A61K8/345A61K8/29A61K8/27A61K8/42A61K8/4946A61K8/4953A61K8/73A61Q17/04A61Q19/00A61Q19/08A61Q5/02A61Q5/12A61K2800/5922A61K2800/82A61K2800/81
Inventor 李伟玲周永茂周清华
Owner 广州万邦实业发展有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products