Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for customizing AFM probe based on FIB equipment and atomic force microscope

A kind of equipment and probe technology, applied in the direction of scanning probe microscopy, scanning probe technology, measuring device, etc., can solve the problems that the detection results deviate from the actual shape of the sample, the AFM probe process is complicated, and the bottom of the sample cannot be touched. , to achieve the effect of improving the preparation yield, reducing the preparation cost and simple method

Active Publication Date: 2022-01-11
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
View PDF13 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a method for customizing AFM probes based on FIB equipment and an atomic force microscope, which is used to solve the problem that the AFM probes in the prior art are complicated in process and easy to be damaged during the preparation process. and other issues, and the height and radius of curvature of the prepared AFM probe tip are fixed, and the height of the prepared probe is relatively small and the radius of curvature is relatively large, which is used for large aspect ratio structures or deep When detecting samples with a groove structure, there are situations where the bottom of the sample cannot be touched, resulting in low resolution and detection results that deviate from the actual shape of the sample, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for customizing AFM probe based on FIB equipment and atomic force microscope
  • Method for customizing AFM probe based on FIB equipment and atomic force microscope
  • Method for customizing AFM probe based on FIB equipment and atomic force microscope

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention. For example, when describing the embodiments of the present invention in detail, for the convenience of explanation, the cross-sectional view showing the device structure will not be partially enlarged according to the general scale, and the schematic diagram is only an example, which should not limit the protection scope of the present invention. In addition, the three-dimensional space dimensions of length, width and depth should be included in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for customizing an AFM probe based on FIB equipment and an atomic force microscope. The method comprises the following steps: providing FIB equipment, fixing a needle tip substrate and a cantilever beam substrate on a sample table, and placing the needle tip substrate and the cantilever beam substrate in a process chamber of the FIB equipment; cutting a needle tip with a required length from the needle tip substrate by utilizing focused ion beam etching, and etching a mounting surface at one end of the cantilever beam substrate by utilizing focused ion beam etching; placing one end of the needle tip on the mounting surface, and fixing one end of the needle tip and the mounting surface by utilizing focused ion beam deposition; and performing bombardment sharpening on the needle tip by utilizing focused ion beam etching so as to process the needle tip into a needle tip with a required size, thereby obtaining the required AFM probe. According to the preparation method of the AFM probe with the controllable needle point height and curvature radius, the FIB technology is utilized, the probe preparation flexibility is greatly improved, the method can be used for customizing AFM probes with various special parameters to meet different detection requirements, the preparation yield is increased, and the preparation cost is reduced.

Description

technical field [0001] The invention belongs to the field of nano-manufacturing and processing, and in particular relates to a method for customizing an AFM probe based on FIB equipment and an atomic force microscope. Background technique [0002] Atomic Force Microscope (AFM) is a high-resolution testing and characterization instrument that can analyze various materials and samples in atmospheric and liquid environments. Compared with STM (Scanning Tunneling Microscope, scanning tunneling microscope), AFM has the biggest advantage It can detect non-conductive samples, and has been widely used in the fields of semiconductor (especially for various sample detection in integrated circuit manufacturing processes), biology, and medical research. [0003] The AFM probe consists of three important parts: the needle tip, the cantilever and the substrate. AFM detects very small van der Waals force. The probe is the core of AFM to achieve high-precision detection, so AFM has very hig...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/24G01Q60/38
CPCG01Q60/24G01Q60/38
Inventor 董业民胡康康黄亚敏王刘勇
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products