Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Slurry recovery system and method in electronic-grade polycrystalline silicon production

A recovery system, polysilicon technology, applied in separation methods, chemical instruments and methods, halogenated silanes, etc., can solve the problems of single filter residue treatment form, poor treatment effect, and high production cost, and achieve high heat transfer surface utilization. and thorough, exhaust-stabilizing effect

Pending Publication Date: 2022-01-25
南通友拓新能源科技有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the treatment process of solid-liquid separation of slurry generally adopts dry vaporization and thickening, and the treatment form of the filter residue obtained after thickening is very simple, the process is too simple, the treatment effect is poor, the waste phenomenon is serious, and a large amount of lye is also consumed , the production cost is relatively high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Slurry recovery system and method in electronic-grade polycrystalline silicon production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The specific implementation manner of the present invention will be further described below, and this embodiment does not constitute a limitation to the present invention.

[0019] like figure 1 A slurry recovery system in the production of electronic grade polysilicon is shown, including a rotary filter 1, an overflow tank 2, a vacuum paddle dryer 3, a hydrolysis tank 4, a condenser 5, and a liquid storage tank 6, and the rotary filter 1 The inlet of the rotary filter 1 is connected to the bottom inlet of the overflow tank 2, the top outlet of the overflow tank 2 is connected to the inlet of the vacuum paddle dryer 3, and the bottom outlet of the vacuum paddle dryer 3 is connected to the hydrolysis tank 4 is connected at the top, the outlet of the upper end of the hydrolysis tank 4 is connected with the waste liquid pool 7, the exhaust port at the top of the vacuum paddle dryer 3 is connected with the condenser 5, and the liquid outlet of the condenser 5 is connected w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a slurry recovery system and method in electronic-grade polycrystalline silicon production. The slurry recovery system comprises a rotary filter, an overflow tank, a vacuum paddle dryer, a hydrolysis tank, a condenser and a liquid storage tank, wherein slurry is introduced into the inlet of the rotary filter, the outlet of the rotary filter is communicated with the bottom inlet of the overflow tank, the top outlet of the overflow tank is communicated with the inlet of the vacuum paddle dryer, the bottom outlet of the vacuum paddle dryer is communicated with the top of the hydrolysis tank, the upper end outlet of the hydrolysis tank is connected with a waste liquid pool, the top exhaust port of the vacuum paddle dryer is communicated with the condenser, and the liquid outlet of the condenser is communicated with the inlet of the liquid storage tank. According to the invention, the system has the advantages that tail gas can be directly condensed and recovered, a dust remover is prevented from being blocked, long-period operation of the system is ensured, hydrolysis and neutralization are thorough under the action of a hydrolysis tank stirrer, reaction is mild, the conditions of blasting boiling and incomplete reaction are avoided, discharged gas is stable in the hydrolysis process, and zero emission of HCI is ensured through alkali washing.

Description

technical field [0001] The invention relates to the technical field of polysilicon production, in particular to a slurry recovery system and method thereof in the production of electronic-grade polysilicon. Background technique [0002] The slurry produced in the polysilicon production line contains a lot of chlorosilanes. If it is dumped and buried without proper treatment, it will seriously damage the ecological environment. The slurry mainly comes from the hydrogenation unit, and its main components are silicon powder, silicon tetrachloride, silicon trichloride, high boilers and metal chlorides, of which the content of silicon powder accounts for 20%, the content of chlorosilane accounts for 79.5%, and other It accounts for 0.5%. At present, the domestic treatment process for solid-liquid separation of slurry generally adopts dry vaporization and thickening. A large amount of lye has a relatively high production cost. Therefore, it is an urgent problem for the industry t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01D1/00B01D1/30B01J19/20B01D53/14B01D53/00C01B33/107
CPCB01D1/0011B01D1/0082B01D1/30B01J19/20B01D53/1406B01D53/002C01B33/107
Inventor 徐建均周同义
Owner 南通友拓新能源科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products