Preparation method of avalanche photodetector
An avalanche photoelectric and detector technology, applied in the field of photoelectric detectors, can solve the problems of inconsistency of detectors, difficult diffusion of Zn, and reduced yield, etc., and achieves reduction of tunneling dark current, high crystal quality, and reduction of electric field strength. Effect
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[0051] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solution of the present invention will be further described below in conjunction with specific examples.
[0052] Such as figure 1 Shown, a kind of preparation method of avalanche photodetector comprises the following steps:
[0053] Step 1: On the p-type InP substrate 1, grow the p-type InP buffer layer 2, InP 0.53 Ga 0.47 As absorption layer 3, In 1-x-y Al x Ga y As bandwidth gradient layer 4, p-type In 0.52 Al 0.48 As charge control layer 5, In 0.52 Al 0.48 As multiplication layer 6, In x Ga 1-x As y P 1-y The stop layer 7 and the p-type InP capping layer 8 are etched.
[0054] Step 2: Using SiO 2 The patterned hard mask uses an etching method to etch the p-type InP cap layer 8 in a specific area. The etched area includes a central area and one or more annular areas surrounding the central area. In this embodiment, it includes An annula...
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