Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Graphene transfer method for stripping polymer support material based on alcohol solvent

A transfer method and alcohol solvent technology, which is applied in the field of material chemistry, can solve the problems of incomplete removal of PMMA, residual PMMA, and graphene damage, and achieve the effects of improving transfer efficiency and application efficiency, high-quality transfer, and reducing damage

Active Publication Date: 2022-03-18
香港城市大学深圳研究院
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method cannot completely remove PMMA, and often remains a lot of PMMA, and causes damage to graphene
Although there are methods to reduce the residue of PMMA, such as high-temperature annealing, this method will cause defects in graphene

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Graphene transfer method for stripping polymer support material based on alcohol solvent
  • Graphene transfer method for stripping polymer support material based on alcohol solvent
  • Graphene transfer method for stripping polymer support material based on alcohol solvent

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] This embodiment provides a graphene transfer method based on alcohol solvent stripping polymer support material, such as figure 1 and figure 2 shown, including the following steps:

[0047] Step 1, according to the weight ratio of PVP-co-PMMA powder (purchased from Sigma-Aldrich, product number is 474576, CAS number: 24979-71-3) and cyclopentanone is 1:4, dissolve PVP-co-PMMA In cyclopentanone, the filtered filtrate is PVP-co-PMMA polymer solution; according to the weight ratio of PMMA powder and dibromomethane is 1.5:98.5, PMMA powder is dissolved in dibromomethane, and the filtered filtrate is PMMA high-molecular solution. molecular solution.

[0048] Step 2, spin coating PVP-co-PMMA polymer solution on the graphene (commercially available) surface of copper substrate, the rotating speed of spin coating is 3000rpm / s, heat 60min at 80 ℃ after spin coating, on graphene surface A PVP-co-PMMA film with a thickness of 2 μm was formed on it.

[0049] Step 3, spin-coat ...

Embodiment 2

[0058] This embodiment provides a method for transferring graphene to an organic electro-optic polymer film by using the method of the present invention. The specific process is the same as in Example 1, except that the silicon dioxide substrate in Example 1 is replaced by an organic electro-optic polymer. film.

[0059] As a comparison, a small amount of acetone was dropped on the organic electro-optic polymer film, and the damage of acetone to the organic electro-optic polymer film was observed.

[0060] Figure 4 It is the photo of the organic electro-optic polymer film in Example 2 before and after being destroyed by acetone. It can be seen from the comparison that the organic polymer material is easily destroyed by acetone.

[0061] Figure 5 For Example 2, graphene is transferred onto an organic electro-optic polymer film using the method of the present invention, before and after peeling off the supporting polymer PVP-co-PMMA and PMMA. The organic electro-optic poly...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a graphene transfer method for stripping a polymer support material based on an alcohol solvent. The method comprises the following steps: spin-coating a PVP-co-PMMA polymer solution on the graphene surface of a metal substrate, and heating and curing to form a layer of PVP-co-PMMA film; spin-coating a PMMA (polymethyl methacrylate) polymer solution, and heating and curing to form a layer of PMMA film; the metal substrate is removed, and PMMA / PVP-co-PMMA / graphene is obtained; washing with water, and adhering with a target substrate to obtain a PMMA / PVP-co-PMMA / graphene / target substrate; the PVP-co-PMMA film is soaked and dissolved in an alcohol solvent, the PMMA film falls off, and graphene transfer is completed. According to the method, graphene can be transferred to a special material which can be damaged by acetone, and the defect that a polymer material supports graphene transfer is overcome; and PMMA is not left, so that the transfer efficiency and the application efficiency of graphene are improved.

Description

technical field [0001] The invention belongs to the technical field of material chemistry and relates to a graphene transfer method for stripping a polymer support material in an alcohol solvent. Background technique [0002] Since single-layer graphene was obtained by mechanical exfoliation for the first time in 2004, graphene has attracted the attention and research of scientists all over the world because of its good electrical, optical, thermal and mechanical properties. Mechanical exfoliation method, SiC epitaxial growth method, redox method and chemical vapor deposition method are the main preparation methods of graphene. Among them, chemical vapor deposition (CVD) can prepare more graphene because of its simple preparation method and strong operability. Large-area, high-quality, and different-performance single-layer / multi-layer graphene is the current mainstream method. [0003] In the CVD method, methane is used as the main gas source to grow monolayer / multilayer g...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/194
CPCC01B32/194Y02E10/549
Inventor 罗敬东王文吴杰云郑建成
Owner 香港城市大学深圳研究院
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com