Autocatalytic resin oligomer based on DCPD phenol structure, condensate and preparation method

A technology of self-catalyzed resins and oligomers, applied in chemical instruments and methods, preparation of organic compounds, preparation of carboxylic acid nitriles, etc., can solve the problems of unreachable and limited application range, achieve wide processing window and simple process Controllable, low reaction temperature effect

Pending Publication Date: 2022-04-26
SINOSTEEL ANSHAN RES INST OF THERMO ENERGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Japanese patent JP7206995 discloses the preparation method of DCPD phenol resin. Japanese patents JP4170423 and JP10081731 have improved the process. Domestic Hou Caiying, Hu Yanfang and others have also carried out in-depth research on this, but some properties such as thermal stability and mechanical properties are not up to the standard. Requirements in special environments limit its scope of application

Method used

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  • Autocatalytic resin oligomer based on DCPD phenol structure, condensate and preparation method
  • Autocatalytic resin oligomer based on DCPD phenol structure, condensate and preparation method
  • Autocatalytic resin oligomer based on DCPD phenol structure, condensate and preparation method

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preparation example Construction

[0033] The preparation method of the self-catalyzed resin oligomer based on DCPD phenol structure specifically comprises the following steps:

[0034] 1) Mix DCPD phenol, cyano monomer, and catalyst, and react in a solvent. The reaction is carried out under the protection of an inert atmosphere, such as: nitrogen protection or argon protection

[0035] The catalyst is an organic base or an inorganic base, such as one or more of anhydrous potassium carbonate, anhydrous sodium carbonate, potassium hydroxide, sodium hydroxide, and sodium bicarbonate.

[0036] The solvent is a polar solvent, such as: one or more of NMP (N-methylpyrrolidone), DMF (N,N-dimethylformamide), DMSO (dimethyl sulfoxide), acetonitrile, preferably one of a kind.

[0037] The reaction temperature is 70-150° C., preferably 80-90° C.; the reaction time is controlled within 3-6 hours, preferably 4-5 hours.

[0038] Wherein, the molar ratio of DCPD phenol: cyano monomer is 1:(1.7-2.6), preferably 1:1.8. The c...

Embodiment 1

[0042] Add 30g (0.06mol) of DCPD phenol resin, 19g (0.11mol) of 4-nitrophthalonitrile, 30g (0.22mol) of anhydrous potassium carbonate, and 150ml of DMF into a three-necked flask, and heat it to 80°C under the protection of nitrogen to react 4 hours. The reaction solution was filtered to remove the catalyst, and part of the solvent was recovered from the filtrate under reduced pressure.

[0043] The filtrate is poured into 5wt% hydrochloric acid solution for sedimentation, filtered, stirred and washed with deionized water for 2 to 3 times until the filtrate is neutral, and the filter cake is vacuum-dried to obtain an autocatalyzed resin oligomer, see figure 1 .

[0044] The resulting oligomer was pre-cured at 250°C for 4 hours and cured at 315°C for 2 hours to obtain a cured self-catalyzed resin, see figure 2 .

Embodiment 2

[0046] Add 30g (0.06mol) of DCPD phenol resin, 21g (0.12mol) of 4-nitrophthalonitrile, 40g (0.29mol) of anhydrous potassium carbonate, and 170ml of DMF into a three-necked flask, and heat it to 80°C under the protection of nitrogen to react 4 hours. The reaction solution was filtered to remove the catalyst, and part of the solvent was recovered from the filtrate under reduced pressure.

[0047] The filtrate is poured into 3 wt% hydrochloric acid solution for sedimentation, filtered, stirred and washed with deionized water for 2 to 3 times until the filtrate is neutral, and the filter cake is vacuum-dried to obtain an autocatalyzed resin oligomer.

[0048] The obtained oligomer was pre-cured at 250° C. for 4 hours and cured at 315° C. for 2 hours to obtain a cured self-catalyzed resin.

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Abstract

The invention relates to an autocatalytic resin oligomer based on a DCPD phenol structure, a condensate and a preparation method, and the molecular structural formula of the autocatalytic resin oligomer is shown in the specification. The preparation method comprises the following steps: 1) mixing DCPD phenol, a cyano monomer and a catalyst, and reacting in a solvent; and 2) slowly pouring the reaction solution into a hydrochloric acid dilute solution, settling, filtering, stirring and washing with deionized water for 2-4 times until the filtrate is neutral, and carrying out vacuum drying on a filter cake to obtain the autocatalytic resin oligomer. The invention has the advantages that the cyano group is introduced, the rotation energy barrier of a molecular chain is improved, and a plurality of functional groups such as hydroxyl, benzene ring, five-membered ring and six-membered ring in the structure exist, so that the epoxy resin has good insulation reliability and self-curing performance, can be easily dissolved in part of organic solvents, and is low in melting point and low in autocatalytic curing temperature.

Description

technical field [0001] The invention belongs to a self-catalyzed resin oligomer based on DCPD phenol structure, a cured product and a preparation method. Background technique [0002] Dicyclopentadiene (DCPD) is a diene in the cracking C5 fraction. Because the structure contains two unsaturated double bonds at the same time, its chemical properties are very active. Using the unsaturation of DCPD, it can be combined with alcohol, phenol, Unsaturated carboxylic acid, aromatic hydrocarbon, etc. are copolymerized to form various modified resins such as unsaturated polyester resin, epoxy resin, DCPD phenol resin, etc. Among them, DCPD phenol resin contains multiple functional groups such as five-membered rings, six-membered rings, and phenolic hydroxyl groups. This special structure makes it have good chemical reaction performance and electrical insulation performance, and can be used in electronic packaging, electrical appliances, ships and other fields. . Japanese patent JP72...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C253/30C07C253/34C07C255/54C08G73/06
CPCC07C253/30C07C253/34C07C255/54C08G73/0683C07C2603/68
Inventor 王广兴李懿轩王海洋王守凯张功多王艳慧屈滨
Owner SINOSTEEL ANSHAN RES INST OF THERMO ENERGY CO LTD
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