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Extreme ultraviolet laser monoenergetic system and method

An extreme ultraviolet light and extreme ultraviolet technology, applied in the field of lasers, can solve problems such as inability to effectively select reaction channels, increase data analysis costs, and affect conclusions, and achieve effective visualization of single-energy selection, clear reaction process, and low-energy loss propagation. Effect

Pending Publication Date: 2022-06-24
雷建廷
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, most experiments directly participate in the reaction of all extreme ultraviolet light generated from high-order harmonics, without single-frequency selection, resulting in the participation of extreme ultraviolet light with different energies in the reaction, the reaction is complicated, and it is impossible to effectively select its own reaction channel. It reduces the cost of subsequent data analysis and ultimately affects the conclusion of the experiment

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  • Extreme ultraviolet laser monoenergetic system and method
  • Extreme ultraviolet laser monoenergetic system and method

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Embodiment Construction

[0037] like figure 1 and figure 2 As shown, an EUV laser monochromatic system includes a first aperture 1, a convex lens 2, a second aperture 3, a hollow waveguide 4 (optical fiber), a rotatable mirror 5, a first gold-plated focusing mirror 6, Aluminum film 7, gold-plated grating 8, small hole mirror 9, CCD camera 10, picoammeter 11, second gold-plated focusing mirror 12, vacuum frame / tube, Pfeiffer 300 molecular pump 14, Pfeiffer 80 molecular pump 15 and mechanical Pump 16. Among them, the first diaphragm 1, the convex lens 2, the second diaphragm 3 and the hollow waveguide 4 are installed on the same line; the hollow waveguide 4, the rotatable mirror 5, the first gold-plated focusing mirror 6, the aluminum film 7, the gold-plated The grating 8, the small hole mirror 9, the probe of the picoammeter 11 and the second gold-plated focusing mirror 12 are connected to each other through the vacuum frame / tube and the flange in sequence. In general, the femtosecond infrared ligh...

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Abstract

The invention discloses an extreme ultraviolet laser monoenergetic system and method. The system comprises a higher harmonic generation module, a rotatable reflector, a first gold-plated focus lens, an aluminum film, a gold-plated blazed grating, a small-hole reflector, a picoammeter, a second gold-plated focus lens and a vacuum frame. The rotatable reflecting mirror, the first gold-plated focusing mirror, the aluminum film, the gold-plated blazed grating, the small-hole reflecting mirror, the picoammeter and the second gold-plated focusing mirror are sequentially connected through flanges and are arranged on the vacuum frame, and the method comprises the following steps of: focusing extreme ultraviolet photons and infrared light through the first gold-plated focusing mirror; after infrared light is filtered out through an aluminum film, needed single-frequency extreme ultraviolet light is separated and screened out through a gold-plated blazed grating, and then the single-frequency extreme ultraviolet light enters a picoammeter through a small-hole reflector to measure the relative intensity of the light and then enters a second gold-plated focus lens to be focused to a reaction cavity. The device is compact in structure, simple in light path, convenient to actually adjust and high in stability, and efficient and low-energy-loss propagation and effective visual single-energy selection of the extreme ultraviolet laser are achieved.

Description

technical field [0001] The invention belongs to the technical field of lasers, and in particular relates to a system and method for single energy of extreme ultraviolet laser. Background technique [0002] In recent years, with the rapid development of laser technology, attosecond pulses and extreme ultraviolet lasers have been widely used in various fields (semiconductor materials, atomic and molecular physics, chemistry, etc.). The technology of generating EUV pulses based on ultrashort pulses (fs magnitude) is also becoming more and more mature. Research using EUV lasers not only gives us a full understanding of physical reaction processes on ultra-short time scales, but also enables effective regulation of chemical reaction processes. At present, there are many ways to generate EUV lasers, such as large-scale device free electron lasers and desktop EUV light sources. The principle of the free electron laser is that the free electron beam in the relativistic energy regi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/067
CPCH01S3/0675
Inventor 雷建廷刘作业张少锋
Owner 雷建廷
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