Boron rod, polarization maintaining optical fiber containing boron rod and preparation method and application of polarization maintaining optical fiber
A boron rod and reaction tube technology, which is applied in the field of polarization-maintaining optical fiber and its preparation, can solve the problems of low boron doping amount, poor polarization-maintaining performance and low compressive stress of the boron rod, so as to increase the doping amount, improve the thermal conductivity, The effect of reducing volatilization
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[0047] Based on the above definitions, the embodiments of the present application provide a method for preparing a boron rod, comprising the following steps:
[0048] S1. Soak the high-purity quartz reaction tube in hydrofluoric acid to eliminate surface stains, and the treated reaction tube is flame-polished, and SF is passed into it at the same time. 6 Corrosion; the reaction tube obtained by this step can remove some impurities on the surface of the tube wall, thereby reducing the background loss of the optical fiber, and then deposit a barrier layer in the reaction tube: use a hydrogen-oxygen lamp as a mobile heating source, at 1800-2000 ℃, such as At 1800°C, 1900°C, and 2000°C, 180-250Sccm of SiCl was simultaneously introduced into the reaction tube. 4 , 8-10Sccm gas phase BCl 3 , 600-1000Sccm of oxygen and 300-500Sccm of helium to obtain a reaction tube with a barrier layer vapor-deposited on the inner wall, here, a suitable but not limited gas-phase BCl 3 The volume f...
Embodiment 1
[0067] A preparation method of boron rod, comprising the following steps:
[0068] S1. The reaction tube is immersed in hydrofluoric acid to eliminate surface stains; the reaction tube is flame-polished, and at the same time, SF6 is etched to obtain a smooth and clean reaction tube;
[0069] S2. Deposition barrier layer: the temperature is 2000°C, and 230Sccm of SiCl is fed into the reaction tube at the same time 4 , 8Sccm of gas-phase BCl 3 , 600Sccm of oxygen, 300Sccm of helium;
[0070] S3. Deposition of loose layer: The mixed gas of silicon tetrachloride and oxygen with a flow volume ratio of 1:3 is introduced into the reaction tube, and the loose layer is deposited at a temperature of 1600 ° C. At this time, the moving speed of the hydrogen-oxygen lamp is 100 mm / min. , the rotation speed of the reaction tube is 60rpm, and then a loose layer with a specific porosity structure is obtained to prepare for the uniform incorporation of boron in the next step;
[0071] S4. Pa...
Embodiment 2
[0076] A preparation method of boron rod, comprising the following steps:
[0077] S1. The reaction tube is immersed in hydrofluoric acid to eliminate surface stains, the reaction tube is flame polished, and SF6 is passed through to corrode to obtain a smooth and clean reaction tube;
[0078] S2. Deposition barrier layer: the temperature is 2000°C, and 230Sccm of SiCl is fed into the reaction tube at the same time 4 , 8 gas phase BCl3, 600Sccm oxygen, 300Sccm helium, the flow volume ratio of oxygen and helium is 2:1;
[0079] S3. Deposition of loose layer: The mixed gas of silicon tetrachloride and oxygen with a flow volume ratio of 1:3 is introduced into the reaction tube, and the loose layer is deposited at a temperature of 1600 ° C. At this time, the moving speed of the hydrogen-oxygen lamp is 100 mm / min. , the rotation speed of the reaction tube is 60rpm, and then a loose layer with a specific porosity structure is obtained to prepare for the uniform incorporation of boro...
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