Preparation method of anti-fog HUD (Head Up Display) film
An anti-fog and anti-fog layer technology, applied in chemical instruments and methods, other chemical processes, coatings, etc., can solve the problems of no HUD film and easy fogging, and achieve the effect of good basic performance and good anti-fog performance
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Embodiment 1
[0024] A preparation method of an anti-fog HUD film, comprising the following steps:
[0025] (1) Preliminarily clean the polycarbonate substrate, remove impurities such as particles on the surface, and dry;
[0026] (2) Put it into a vacuum chamber, adjust the plasma power to 800w, the distance between the surface of the polycarbonate substrate and the nozzle of the plasma generator is 2mm, and carry out plasma treatment on the surface of the washed polycarbonate substrate at a speed of 3cm / s 10min;
[0027] (3) Turn on the radio frequency ion source to start film formation, ①deposit Ti 3 O 5 The process parameters of the membrane ion source are: voltage 500V, current 500mA; ion source gas is O 2 100mL / min, Ar 5mL / min; Neutralization gas is Ar 8mL / min; ② SiO deposition 2 The process parameters of the membrane ion source are: voltage 500V, current 500mA; ion source gas is O 2 50mL / min; Neutralization gas is Ar 8mL / min;
[0028] (4) preparation of the intermediate layer s...
Embodiment 2
[0034] A preparation method of an anti-fog HUD film, comprising the following steps:
[0035] (1) Preliminarily clean the polycarbonate substrate, remove impurities such as particles on the surface, and dry;
[0036] (2) Put it into a vacuum chamber, adjust the plasma power to 800w, the distance between the surface of the polycarbonate substrate and the spray gun mouth of the plasma generator is 3mm, and perform plasma treatment on the surface of the washed polycarbonate substrate at a speed of 3cm / s 11min;
[0037] (3) Turn on the radio frequency ion source to start film formation, ①deposit Ti 3 O 5 The process parameters of the membrane ion source are: voltage 500V, current 500mA; ion source gas is O 2 100mL / min, Ar 5mL / min; Neutralization gas is Ar 8mL / min; ② SiO deposition 2 The process parameters of the membrane ion source are: voltage 500V, current 500mA; ion source gas is O 2 50mL / min; Neutralization gas is Ar 8mL / min;
[0038] (4) prepare the interlayer sol; the ...
Embodiment 3
[0044]A preparation method of an anti-fog HUD film, comprising the following steps:
[0045] (1) Preliminarily clean the polycarbonate substrate, remove impurities such as particles on the surface, and dry;
[0046] (2) Put it into a vacuum chamber, adjust the plasma power to 800w, the distance between the surface of the polycarbonate substrate and the spray gun mouth of the plasma generator is 3mm, and carry out plasma treatment on the surface of the washed polycarbonate substrate at a speed of 3cm / s 12min;
[0047] (3) Turn on the radio frequency ion source to start film formation, ①deposit Ti 3 O 5 The process parameters of the membrane ion source are: voltage 500V, current 500mA; ion source gas is O 2 100mL / min, Ar 5mL / min; Neutralization gas is Ar 8mL / min; ② SiO deposition 2 The process parameters of the membrane ion source are: voltage 500V, current 500mA; ion source gas is O 2 50mL / min; Neutralization gas is Ar 8mL / min;
[0048] (4) prepare the intermediate layer ...
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