Novel vacuum coating equipment combining double evaporation sources and plasma coating source

A plasma and dual evaporation source technology, applied in vacuum evaporation coating, ion implantation coating, sputtering coating and other directions, can solve the problems of low production efficiency, difficulty in ensuring vacuum degree, affecting coating quality, etc., to improve quality , Guaranteed quality, good film uniformity

Pending Publication Date: 2022-08-09
广东腾胜科技创新有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing coating method adopts the combination of two equipments, which has low production efficiency, and it is difficult to ensure a good vacuum degree when entering from one equipment to another equipment, which affects the quality of the coating film.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel vacuum coating equipment combining double evaporation sources and plasma coating source
  • Novel vacuum coating equipment combining double evaporation sources and plasma coating source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0019] like figure 1 and figure 2 As shown, a new type of vacuum coating equipment combining dual evaporation sources and plasma coating sources includes a vacuum chamber 1, an unwinding system 2 and a winding system 5 arranged in the vacuum chamber 1, and the unwinding system 2 and the winding system 5 are arranged in the vacuum chamber 1. There are double coating rollers 6 between the systems 5, and a gas barrier plate 7 is arranged in the vacuum chamber 1. The gas barrier plate 7 divides the inside of the vacuum chamber 1 into a plasma coating source chamber 10 and an evaporation coating chamber 20. The double coating rollers 6 are provided. In the plasma coating source chamber 10 , the film substrate is output from the unwinding system 2 , enters the plasma coating source chamber 10 and the evaporation coating chamber 20 , bypasses the doub...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses novel vacuum coating equipment combining double evaporation sources and a plasma coating source, which comprises a vacuum chamber, an unwinding system and a winding system which are arranged in the vacuum chamber, double coating rollers are arranged between the unwinding system and the winding system, and a gas separation plate is arranged in the vacuum chamber. The gas separation plate divides the interior of the vacuum chamber into a plasma coating source chamber and an evaporation coating chamber, the double coating rollers are arranged in the plasma coating source chamber, and a film base material is output from the unwinding system, enters the plasma coating source chamber and the evaporation coating chamber, bypasses the double coating rollers and then is rewound on the winding system. According to the novel vacuum coating equipment combined with the double evaporation sources and the plasma coating source, composite evaporation coating and plasma coating source film forming are integrated, the coating mode that plasma coating source film forming and thermal evaporation are alternated is achieved, the uniformity and binding force of a film layer are improved, coating is conducted in a reciprocating mode, and the coating efficiency is improved. The deposition of the coating thickness is accelerated, and the coating speed and the production efficiency are improved.

Description

technical field [0001] The invention relates to the technical field of vacuum coating equipment, in particular to a novel vacuum coating equipment combining double evaporation sources and plasma coating sources. Background technique [0002] At present, the winding coating equipment mostly adopts two methods of vacuum evaporation coating and vacuum sputtering coating. Or sequentially and repeatedly through the combination of evaporation coating and plasma coating source film formation. Among them, the thicknesses of the two coated films are different, and the requirements for the degree of vacuum are also different. With the development of thin-film batteries and new energy batteries and other fields, there is an urgent need for new thin-film materials; the thin-film layer should be thick, the film layer uniformity and bonding force should be good, and the production efficiency should be high, which is suitable for mass production. However, the existing coating equipment n...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/24C23C14/56
CPCC23C14/32C23C14/24C23C14/56Y02P70/50
Inventor 朱刚劲朱刚毅
Owner 广东腾胜科技创新有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap