Process for the formation of polyhedral oligomeric silsesquioxanes
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- HYBRID PLASTICS INC
- Publication Date
- 2002-10-30
- Estimated Expiration
- Not applicable · inactive patent
Abstract
Description
Background of the invention
[0001] The present invention describes methods that enable selective control of the silicon-oxygen backbone structure in polyhedral oligomeric silsesquioxane (POSS) cage molecules. It is desirable to be able to selectively control the framework structure of POSS as they serve as chemical species that can be further converted or incorporated into a wide variety of chemical feedstocks for the preparation of catalyst supports, monomers, polymers, And as a solubilized form of silica to replace fumed and precipitated silica or for biological applications and surface modification. POSS, when incorporated into polymeric materials, can provide new and improved thermal, mechanical and physical properties to common polymeric materials.
[0002] A wide variety of POSS framework structures can be synthesized in useful quantities by hydrolytic condensation of alkyl- or aryl-trichlorosilanes. However, in most cases, hydrolytic condensation reactions of trifunct...