Process for the formation of polyhedral oligomeric silsesquioxanes
A polysilsesquioxane, silsesquioxane technology, applied in silicon-oxygen skeleton structure, various types of R groups. domain, able to address issues such as unproven effects
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[0074] In Omega-500 ( 1 H, 500MHz; 13 C, 125MHz; 29 NMR spectra were recorded on Si, 99 MHz). Tetrahydrofuran and methyl isobutyl ketone were distilled before use. All other solvents were purchased without purification.
[0075] Example of Method I. Conversion of Polysilsesquioxanes to POSS Fragments and Nanostructures
[0076] by [(C 6 h 5 ) SiO 1.5 ] ∞ Resin synthesis [((C 6 h 5 ) SiO 1.5 ) 8 ] ∑8 Toluene (100mL) in [(C 6 h 5 ) SiO 1.5 ] ∞ To the resin (13.0 g, 100.6 mmol) was added tetramethylammonium hydroxide (2.0 mL, 5.57 mmol). The reaction mixture was heated to 80 °C for up to 12 hours, then cooled to room temperature, acidified with 1N HCl, and filtered to give 12.065 g [((C 6 h 5 ) SiO 1.5 ) 8 ] ∑8 of white solid. The product was examined by EIMS, which showed a molecular ion of 1032.5 amu (atomic mass units) accompanied by product ions of 954.7, 877.4 and 800.6 amu corresponding to the loss of one, two and three phenyl groups, respectively. F...
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