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Polishing composition for polishing surface of memory, hard disk and magnetic head and its polihsing method

A technology of polishing composition and memory, which is applied in the direction of polishing composition containing abrasives, chemical instruments and methods, and other chemical processes, which can solve the problems of surface material corrosion and scratching, and achieve the effect of low surface roughness

Inactive Publication Date: 2002-12-11
NAKE IND SHENZHEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the one hand, the DLC protective film cannot completely cover scratches and black spots, which may easily cause corrosion of the surface material; on the other hand, the bumps on the surface may easily cause scratches

Method used

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Examples

Experimental program
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Embodiment Construction

[0019] Polishing composition embodiment of the present invention is described in detail as follows:

[0020] (1) Abrasives

[0021] Among the components of the polishing composition of the present invention, suitable primary abrasives are selected from nanoscale diamond, silica, alumina, ceria, titania, silicon nitride, zirconia and manganese dioxide. The abrasive is not limited to any particular one of these abrasives.

[0022] Diamond includes diamond or diamond-like powder crushed from type I, II, III and IV diamond materials and mixtures of four types of diamond powder in different proportions, as well as diamond or diamond-like powder crushed by various methods. It also includes various diamond or diamond-like powders produced by detonation.

[0023] Silica includes colloidal silica, fumed silica, and many other types of silica that differ in their preparation methods or properties.

[0024] In addition, alumina includes α-alumina, δ-alumina, θ-alumina, κ-alumina, and ...

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Abstract

The present invention belongs to the field of surface polishing treatment technology. The polish composition consists of one or more abrasive(s) selected from nanometer-level diamond, silica, alumina, cerium oxide, zirconium oxide, titania, silicon nitride and manganese dioxide in the amount of 0.01-50 wt%; alkane mineral oil or synthetic oil in 50-99.99 wt%; and buffering agent component in 0-50wt%. The composition has pH value of 6-8. The polish composition is sprayed to grinding plate of polisher to polish the surface of magnetic head in memory and hard disk and to polish other metal and non-metal surface to reach sub-nanometer level roughness.

Description

technical field [0001] The invention belongs to the technical field of surface polishing treatment, and in particular relates to a material and a polishing method for polishing the surface of a magnetic head of a memory hard disk. Background technique [0002] People are constantly making memory hard disks smaller in size and larger in storage capacity, so the magnetic heads of memory hard disks have evolved from AMR to GMR and TMR. [0003] With the increase of the storage hard disk capacity, the recording density of the hard disk increases by tens of percentage points every year. According to the principle of hard disk reading and writing, the improvement of hard disk storage density actually means that there are more magnetic storage units per unit area, the space occupied by recording information is narrower than before, and the magnetic force required for recording is also weakened. Therefore, the memory hard disk needs to reduce the magnetic gap (that is, the distance...

Claims

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Application Information

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IPC IPC(8): C09G1/02
CPCC09G1/02C09K3/1472
Inventor 高峰伍德民
Owner NAKE IND SHENZHEN
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