Method of increasing oxygen content in vertical pulling silicon single crystal rod and automatic aerator
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- GRINM SEMICONDUCTOR MATERIALS CO LTD
- Publication Date
- 2003-04-30
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
(1) Technical field
[0001] The invention relates to a doping process and a device for contacting a single crystal with a solid material, more specifically a method and a device for increasing doping oxygen when producing a single crystal silicon rod. (2) Background technology
[0002] Most semiconductor silicon single crystals are produced by the Czochralski method. In this method, polysilicon is put into a quartz crucible, heated and melted, and then the temperature of the molten silicon is slightly lowered, and a certain degree of supercooling is given, and a silicon single crystal (called a seed crystal) with a specific crystal orientation is combined with the molten silicon. Bulk silicon contact, by adjusting the temperature of the melt and the upward lifting speed of the seed crystal, when the seed crystal grows to a diameter close to the target, increase the lifting speed to make the single crystal grow with a nearly constant diameter. At the end of the growth process...