This invention provides a
metal electroplating composition comprising: a
sulfur-containing compound, a
tin salt, a silver salt, an acidic
electrolyte, a surfactant, a brightener, an
antioxidant, a pH adjuster, and water. The
sulfur-containing compound is a compound of formula (I): wherein R1 is selected from primary, secondary, and
tertiary amino groups; R2 is selected from straight-chain
alkyl and branched-chain
alkyl groups; R3 is selected from straight-chain
alkyl and branched-chain alkyl groups; and R4 is selected from
hydrogen and alkyl groups. Using the above technical solution,
electroplating under
high current density conditions can achieve the following technical effects: no pores or defects, low impurities in the plating layer, excellent plating uniformity, dense structure, and low
surface roughness. The
metal electroplating composition has good plating solution stability and plating uniformity, and can obtain consistently good appearance and film thickness uniformity of the plating film. It has good industrial application value.