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Prep. of alumina---monox composite oxides film

A composite oxide and thin film preparation technology, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problem of difficult to obtain aluminum oxide-silicon oxide composite oxide thin film with adjustable ratio, co-deposition process Difficulty in controlling etc.

Inactive Publication Date: 2003-10-15
NORTHWESTERN POLYTECHNICAL UNIV
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Problems solved by technology

[0004] Ha Heung Yong from the Chemical Engineering Department of the Korea Institute of Science and Technology obtained an alumina-silicon oxide composite oxide film by co-deposition of ethyl orthosilicate (hereinafter referred to as TEOS) and aluminum isopropoxide, but because the decomposition temperature of TEOS is higher than 400 °C , and the decomposition temperature of aluminum isopropoxide is lower than 350°C, so it is very difficult to control the co-deposition process, and it is difficult to obtain an aluminum oxide-silicon oxide composite oxide film with an adjustable ratio

Method used

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  • Prep. of alumina---monox composite oxides film

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Embodiment Construction

[0013] specific implementation plan

[0014] figure 1 Schematic diagram of the equipment for the preparation of alumina-silicon oxide composite oxide films for CVD.

[0015] First start the vacuum pump 15 to reduce the pressure in the furnace to below 76 Torr, and the vacuum pump continues to work. The deposition furnace 13 is then raised to a constant temperature. Unscrew the valve 1 on the top of the Ar gas cylinder to release the Ar, the Ar flows through the pressure reducer 2 and then depressurizes to 0.4-0.6MPa, the low-pressure Ar passes through the four-way pipe 3 and is divided into three parts, and a part of Ar passes through the flow meter 4 and enters TEOS for bubbling In bottle 5, the flow rate is 200-400ml / min, the bubble bottle is a glass flask, and the TEOS liquid is contained inside, and the water bath for the bubble bottle is kept at a constant temperature of 40-60°C. Part of Ar enters AlCl through flowmeter 6 3 In the evaporator 7, the flow rate is 200-40...

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Abstract

The present invention is the preparation process of composite alumina-silica film. The composite alumina-silica film with adjustable alumina / silica ratio is prepared in chemical vapor deposition furnace as the composite oxide film producing apparatus with only inert gas argon as carrier gas and diluent gas at the temperature of 500-800 deg.c. The said preparation process may be used in preparing film with strong hydrogen permeability, antiwear coating on the surface of metal and non-oxide ceramic-base composite material as antioxidant coating.

Description

Technical field [0001] The invention relates to a process for preparing aluminum oxide-silicon oxide composite oxide films by chemical vapor deposition (Chemical Vapor Deposition, CVD for short). The film can be used in gas phase separation and catalytic reaction, and can also be used as a metal wear-resistant coating and a functional coating with microwave-permeable properties. Background technique [0002] Inorganic oxide films such as alumina, silica, and alumina-silica composite oxides are widely used in chemical engineering such as gas phase separation and catalysis. The synthesis of thin films with excellent permselectivity is of great importance in the commercial field. Inorganic oxide selectively permeable films are generally prepared by sol-gel method, electroplating and CVD method, among which the performance of similar inorganic films prepared by CVD method is stable and the effect is the best. The CVD method can prepare dense or ultra-microporous inorganic film...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/40
Inventor 陈照峰张立同成来飞徐永东
Owner NORTHWESTERN POLYTECHNICAL UNIV
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