Raw-material compound for CVD and chemical gas-phase steam-plating method for iridium and iridium compound film

Abstract

This invention provides raw material compounds for use in CVD which contain an organic iridium compound as a main ingredient, the organic iridium compound consisting of tris(5-methyl-2,4-hexanedionato)iridium. According to the CVD which uses the above raw material compounds, a pure iridium thin film and an iridium oxide thin film of excellent morphology can be produced effectively.

Description

technical field [0001] The present invention relates to the raw material used for producing iridium or iridium compound film by CVD method and its production method. Background technique [0002] In recent years, precious metals such as iridium and ruthenium have been used as thin-film electrode materials for various semiconductor devices. This is due to the fact that noble metals have low resistivity and have excellent electrical properties as electrodes. In particular, iridium and its oxides are used as the upper and lower electrodes of FeRAM. [0003] The thin film used for the thin film electrode is generally produced by the sputtering method. In recent years, the application of chemical vapor deposition method (Chemical Vapor Deposition method, hereinafter referred to as CVD method) has been researched. This is because a uniform thin film can be easily produced by the CVD method, and its step coverage is superior to that of the sputtering method. Furthermore, as a m...

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Problems solved by technology

But such recycling is difficult for currently known β-diketone iridium compounds.

Because the solid β-diketone iridium compound is very difficult to recover in liquid state, and it is impossible to refine it by distillation

The liquid β-diketone iridium compound is difficult to separate and refine by distillation due to its low vapor pressure.

Therefore, it is difficult to use the known β-diketone iridium compound by the CVD method using recycling technology, and the cost of producing thin films using this compound will increase.