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Substrate and its mfg. method, microlens, substrate, transmitting panel and rear projector

A manufacturing method and technology of microlenses, which are used in the manufacture of microstructure devices, lenses, instruments, etc.

Inactive Publication Date: 2004-08-11
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this case, there is a problem that the connected lines of the lenticular array appear on the projected image

Method used

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  • Substrate and its mfg. method, microlens, substrate, transmitting panel and rear projector
  • Substrate and its mfg. method, microlens, substrate, transmitting panel and rear projector
  • Substrate and its mfg. method, microlens, substrate, transmitting panel and rear projector

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0263] A substrate with a concave portion for a microlens equipped with a concave portion for a microlens was fabricated, and then a microlens substrate was fabricated using the substrate with a concave portion for a microlens in the following manner.

[0264] First, an alkali-free glass substrate having a rectangle of 1.2 m×0.7 m and a thickness of 5 mm was prepared.

[0265] The non-alkali glass substrate was soaked and heated to 30° C. in a cleaning liquid (ie, 4% by weight aqueous solution of ammonium bifluoride (containing a small amount of hydrogen peroxide solution)) to be cleaned, thereby cleaning its surface.

[0266] -1A- Next, a 0.2 µm-thick film (mask and rear surface protective film) containing chromium oxide and chromium (Cr) was formed on the non-alkali glass substrate by a spraying method.

[0267] -2A- Next, the mask was blasted to form a large number of initial holes in the central portion of the mask in an area of ​​113 cm x 65 cm.

[0268] Here...

Embodiment 2

[0280] First, an alkali-free glass substrate having a rectangle of 1.2 m×0.7 m and a thickness of 5 mm was prepared.

[0281] The non-alkali glass substrate was soaked and heated to 30° C. in a cleaning liquid (ie, 4% by weight aqueous solution of ammonium bifluoride (containing a small amount of hydrogen peroxide solution)) to be cleaned, thereby cleaning its surface.

[0282] -1B- Next, a silicon thin film (mask and rear protective film) having a thickness of 0.3 μm was formed on the alkali-free substrate by the CVD method.

[0283] -2B- Next, the mask was laser processed to form a large number of initial holes in the central portion of the mask in an area of ​​113 cm x 65 cm.

[0284] In this regard, laser processing was performed under the condition of 2 mW using the second harmonic of YAG laser.

[0285] In this way, initial holes are formed in a random pattern over the entire area of ​​the above-mentioned mask. The average diameter of the initial pores is 8...

Embodiment 3

[0293] First, an alkali-free glass substrate having a rectangle of 1.2 m×0.7 m and a thickness of 5 mm was prepared.

[0294] The non-alkali glass substrate was soaked and heated to 30° C. in a cleaning liquid (ie, 4% by weight aqueous solution of ammonium bifluoride (containing a small amount of hydrogen peroxide solution)) to be cleaned, thereby cleaning its surface.

[0295] -1C- Next, a thin film (mask and rear surface protective film) consisting of a Cr layer and an Au layer (Cr—Au thin film) was formed on the non-alkali glass substrate by the CVD method. The thickness of the Cr layer was 0.01 μm, and the thickness of the Au layer was 0.2 μm.

[0296] -2C- Next, the mask was spray cleaned to form a large number of initial holes in the central portion of the mask in an area of ​​113 cm x 65 cm.

[0297] Here, at 4kg / cm 2 under the injection pressure and 40kg / m 2 The spray cleaning is carried out under the conditions of using glass beads with an average parti...

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Abstract

A method of manufacturing a substrate 5 with a plurality of concave portions 3 according to the invention includes the steps of forming a mask 6 on the substrate 5, forming a plurality of initial holes 61 on the mask 6 by means of a physical method such as blast processing or irradiation with laser beams, and forming the plurality of concave portions in the substrate 5 by subjecting the mask 6 with the plurality of initial holes 61 to an etching process. In case of carrying out the blast processing, glass beads whose average diameter is in the range of 50 to 100 mum are used as blast media.

Description

technical field [0001] The present invention relates to a method of manufacturing a substrate with a concave portion, a substrate with a concave portion, a substrate with a concave portion for a microlens, a microlens substrate, a transmissive screen and a rear projector. Background technique [0002] In recent years there has been a strong growth in the demand for rear projectors as suitable displays for monitors used in home theaters, large screen televisions or similar products. [0003] In transmissive screens for rear projectors, lenticular lenses are often used. However, this type of screen has a problem in that although its lateral viewing angle is large, its vertical viewing angle is small (ie, there is a shift in viewing angle). [0004] As a solution to this problem, a transmissive screen using a microlens array (microlens substrate) instead of a lenticular lens has been proposed (see, for example, Japanese Laid-Open Patent No. 2000-131506). The transmissive scre...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00G02B3/00G02B5/02G03B21/10G03B21/62
CPCG02B3/0043G02B3/0031G02B3/0025B29D11/00298B29D11/00365B81C1/00015G02B3/08G03B21/10G03B21/62
Inventor 清水信雄山下秀人
Owner SEIKO EPSON CORP
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