Method for producing biological protein molecular chips
A manufacturing method and protein technology, applied in the field of biosensing, can solve the problem of low integration, and achieve the effect of improving the firmness and ensuring the activity
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Embodiment 1
[0018] Embodiment 1: the concrete processing steps of the present invention are as follows:
[0019] a. First, standard semiconductor technology is used to clean and thermally oxidize the silicon wafer; the surface of the cleaned and thermally oxidized silicon wafer has a layer of 500 nanometer silicon dioxide layer;
[0020] b. immerse the above-mentioned pretreated silicon chip in octadecyltrichlorosilane (OTS) for 10 minutes, so that the surface of the silicon chip has octadecyl groups, and octadecyl groups have repellency to protein molecules;
[0021] c. Adopt atomic force microscope (AFM) nano-etching technology to etch nano-patterns on the above-mentioned processed silicon wafer surface; the etching method is: apply a voltage between the atomic force microscope probe and the silicon surface, so that Atoms are oxidized into silicon dioxide; the probe is moved, etched into a square array with a side length of 50 nanometers, and the surface octadecyl group where the etched...
Embodiment 2
[0024] Embodiment two: the concrete processing steps of the present invention are as follows:
[0025] a. First, standard semiconductor technology is used to clean and thermally oxidize the silicon wafer; there is a silicon dioxide layer of 800 nanometers on the surface of the cleaned and thermally oxidized silicon wafer;
[0026] b. immerse the above-mentioned pretreated silicon chip in octadecyltrichlorosilane (OTS) for 10 minutes, so that the surface of the silicon chip has octadecyl groups, and octadecyl groups have repellency to protein molecules;
[0027] c. Adopt atomic force microscope (AFM) nano-etching technology to etch nano-patterns on the above-mentioned processed silicon wafer surface; the etching method is: apply a voltage between the atomic force microscope probe and the silicon surface, so that Atoms are oxidized into silicon dioxide; the probe is moved and etched into concentric circles with a radius of 200 nanometers and 400 nanometers and a line width of 50...
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