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Acoustooptic frequency modulation single exposure imaging interference photo-etching method and system thereof

An imaging interference and lithography system technology, which is applied in the field of acousto-optic frequency modulation single-exposure imaging interference lithography method and its system, can solve the problem of reducing the modulation transfer function of high-frequency components, reducing image contrast and resolution, and difficult to align three exposures. and other problems, to achieve the effect of reducing alignment difficulties, reducing process complexity, and reducing the number of exposures

Inactive Publication Date: 2005-04-20
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

However, the disadvantage of this three-exposure imaging interference lithography is that the exposure process is complex and the alignment between three exposures is difficult; the low-frequency components are repeatedly used for exposure, which reduces the modulation transfer function of high-frequency components, reducing image contrast and resolution. , and three exposures lengthen the exposure period and reduce the exposure efficiency

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  • Acoustooptic frequency modulation single exposure imaging interference photo-etching method and system thereof
  • Acoustooptic frequency modulation single exposure imaging interference photo-etching method and system thereof

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Embodiment Construction

[0014] Such as figure 1 As shown, the acousto-optic frequency modulation imaging interference lithography system of the present invention includes a laser 1, a three-beam beam splitter 2, a variable density attenuation filter 3, an acousto-optic frequency modulator 4, a beam expansion collimation spatial filter 5, a reflector Mirror 6, movable mirror 7, photomask 8, zero-order attenuation filter 9, imaging system 10, movable mirror 11, resist silicon wafer 12, the laser light emitted by laser 1 passes through three beam splitters 2 Divide into three beams of light ①, ② and ③ with a certain angle and approximately equal intensity. After the three beams pass through three variable density attenuation filters respectively, the beam ① passes through the beam expander collimation spatial filter 5 and becomes parallel light Vertically illuminate the photomask 8, and the light beams ② and ③ are changed into light with wavelengths of λ+Δλ and λ-Δλ through the acousto-optic frequency ...

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Abstract

A method and system for acousto-optic FM one-shot exposing imaging interference photo-etching characterizes in using two acousto-optic frequency modulators to move the laser frequency with lambda wave length emitted from a laser to form beams of laser for off-axis illumination light mask on X direction, to form an other beam of laser used in off-axis illuminating the same light mask and using the laser of lambda wavelength to vertically illuminate the light mask. Since three beams of light are incoherent interference beams, images generated by them are laminated incoherently to form a final mask picture, which does not use three laser in different wavelength to expose three times, only needs one shot exposing to finish the imaging photo-etching exposure.

Description

technical field [0001] The invention relates to an acousto-optic frequency modulation single-exposure imaging interference lithography method and system thereof, which belongs to the improvement of the three-exposure imaging interference lithography method and system for generating fine patterns. Background technique [0002] General imaging interference lithography methods and systems are composed of lasers, beam expanders, collimators, spatial filters, reflection devices, photomasks, imaging optical systems, and resist silicon wafers, and three exposure processes are used to complete the interference Lithographic imaging, literature Steven R.J. Brueck, Imaging interferometric lithography, Microlithography World, Winter 1998, 2-10. and literature Xiaolan Chen and S.R.J. Brueck, Imaging interferometric lithography: AWavelength division multiplex approach to extending optical thogaraphy, J.Vac. B 16(6): 3392-3397, Nov. / Dec.1998 describes the technique of image interference li...

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Application Information

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IPC IPC(8): C23F1/08G03F7/20
Inventor 张锦冯伯儒刘娟宗德蓉罗斌
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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