Three pole flat plate display produced by photoetching and aluminium film plating method and its producing process

Abstract

This invention relates to a three-pole panel display and its manufacturing technology applying a method of combining the SnIn oxide film photo-etching and Al film evaporation and plating including a vacuum cavity composed of plate glasses, a control grid for controlling carbon nm tube cathode emit electrons, an anode panel prepared by the method of combining SnIn oxide film photo-etching and Al film plating, a cathode plate printed with carbon nm tubes, having the advantages of simple structure, low production cost and stabilized process.

Description

Technical field [0001] The present invention belongs to the intercrossing fields of vacuum science and technology, microelectronic science and technology, and nano science and technology, and particularly relates to a triode that uses a combination of tin indium oxide (ITO) thin film photolithography and vapor-deposited aluminum film to make an anode panel Flat panel display and its manufacturing process. Background technique [0002] At present, for a field emission flat panel display with a triode structure using carbon nanotubes as a cathode emitting electron material, the service life of the display is one of the important technical indicators to measure the quality of the device. Under normal circumstances, in the production of flat panel displays, the electrons emitted from the carbon nanotube cathode are used to directly bombard the phosphor to emit visible light. The excess electrons pass through the tin indium oxide film layer on the back of the phosphor layer. Flow into...

AI Technical Summary

Problems solved by technology

If the thickness of the aluminum film layer is too large, the emitted electrons cannot pass through the aluminum film layer to bombard the phosphor light-emitting layer, which also causes the failure of the overall device fabrication; if the thickness of the aluminum film layer is too small, the aluminum film The conductivity of the phosphor layer cannot be guaranteed. Secondly, the evaporated aluminum film layer cannot block the high-speed bombardment of emitted electrons, which cannot achieve the goal of improving the service life of the phosphor layer. At the same time, the excess electrons bombarded by the phosphor layer cannot flow to the external circuit. , causing excess electrons to accumulate, resulting in additional discharge of the device

Therefore, in the process of evaporating the aluminum film, the precision of the equipment is very high, which increases the manufacturing cost of the device and reduces the success rate of the device.

Moreover, if the anode panel is made by directly evaporating aluminum film, it will undoubtedly greatly increase the anode operating voltage of the display device, which does not meet the requirements for making low-voltage flat panel display devices, and will not only greatly increase the production cost of the overall device At the same time, it will also make the manufacturing process of the device tend to be complicated, and because the electrical requirements of the device material and the manufacturing process are very high, it will undoubtedly greatly reduce the success rate of the overall flat panel display device.

[0005] How can not only effectively improve the service life of the flat panel display device, but also simplify the device manufacturing process, improve the device's manufacturing success rate, and reduce the device's manufacturing cost. At present, there is no effective method.

Images