Prepn process of metal oxide film
A technology of oxide thin film and metal thin film, which is applied in the field of materials, can solve problems such as the reduction of the use value of the strip, the inability to directly prepare the YBCO film layer, and the deterioration of the mechanical properties of the baseband.
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Embodiment 1
[0032] see figure 1 , the CeO was prepared using the following steps 2 film:
[0033] a. Place the metal cerium target on the target stage 1, place the NiW3% biaxial textured substrate on the substrate stage 2, place the heating resistance wire 3 around and below the substrate stage, and place the thermocouple 5 on the substrate Next to stage 1 , target stage 1 , substrate stage 2 , heating resistance wire 3 and thermocouple 4 are all placed in growth chamber 9 . On the right side of the growth chamber 9, close to the substrate stage, there is an inlet pipe 6 for passing water vapor or oxygen, and on the right side of the growth chamber 9, near the position of the target stage, there is an inlet pipe 7 for passing argon and hydrogen gas, and the lower part is open. The vacuum pump 4 (mechanical pump and molecular pump) is connected, and the positive and negative electrodes of the sputtering power supply 8 are respectively connected to the outer cavity and the target platform...
Embodiment 2
[0046] The difference between this embodiment and embodiment 1 is that
[0047] In step b, maintain a 0.7Pa argon-hydrogen mixed gas in the growth chamber 9;
[0048] In step d, the water vapor pressure is 2.4×10 -3 Pa; keep the total pressure at 0.8Pa, and the substrate temperature at 800°C;
[0049] In step e, the heating time is 30 minutes.
[0050] This specific embodiment is described in detail by taking Ce as an example, and the present invention is also applicable to other rare earth metal thin films.
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