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Manufacturing installation for ice plasm and processing unit for substrates

A technology for a substrate processing device and a manufacturing device, which is applied in the field of particles, and can solve the problems of mixing resin components, metal contamination of substrates, and dissolution of ice particles.

Inactive Publication Date: 2006-08-02
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the substrate is cleaned with such ice slurry, the substrate may be contaminated by metal.
In addition, in the method of releasing the supercooled state of the supercooled water by hitting the supercooled water on the plastic plate, there is also the possibility of resin components being mixed into the pure water.
Also, in the method of impinging supercooled water on a metal or plastic plate, there is a problem that when the ice slurry spreads on the plate, it absorbs heat from the plate, so that the generated ice particles dissolve

Method used

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  • Manufacturing installation for ice plasm and processing unit for substrates
  • Manufacturing installation for ice plasm and processing unit for substrates
  • Manufacturing installation for ice plasm and processing unit for substrates

Examples

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Embodiment Construction

[0037] Hereinafter, best embodiments of the present invention will be described with reference to the drawings.

[0038] Figure 1 to Figure 3 , represents an example of an embodiment of the present invention, figure 1 It is a perspective view which shows the state which cut|disconnected the main-body part of the manufacturing apparatus of ice slurry in the longitudinal direction. figure 2 It is a partially enlarged perspective view of the main body section in a longitudinally cut state. image 3 is an external perspective view of the main body.

[0039] This ice slurry production device is a device for producing a treatment liquid (hereinafter referred to as "ice slurry") that dissolves carbon dioxide and contains ice particles, and its main body 10 is formed in an elongated circular tube shape. That is, the main body 10 has a straight pipe 12 formed such that the inner diameter gradually decreases from the lower end to the upper end, and the lower end surface of the stra...

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PUM

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Abstract

The present invention provides an apparatus for producing a treatment liquid containing ice fine particles produced from a supercooled liquid without a risk of pollutant contamination and dissolution of produced ice fine particles. The ice slurry production apparatus comprises a main body part 10 having a liquid introduction inlet 18 and a gas jetting outlet 24 in a lower part and a discharge outlet 28 for a treated liquid containing the ice fine particles in an upper part. A gas is jetted to the gas jetting outlet 24 to a super cooled liquid introduced into the main body part 10 through the liquid introduction inlet 18 to release the supercooled state and the treated liquid containing the produced ice fine particles is discharged out of the main body part 10 through the discharge outlet 28.

Description

technical field [0001] The present invention relates to ice-containing fine particles used in cleaning of substrates such as semiconductor wafers, liquid crystal display (LCD) glass substrates, plasma display (PDP) glass substrates, printed substrates, ceramic substrates, electronic device substrates, etc. An ice slurry manufacturing device for a processing liquid of the present invention, and a substrate processing device for performing processing such as cleaning of a substrate using the processing liquid containing ice particles produced by the ice slurry manufacturing device. Background technique [0002] For example, the cleaning of substrates in flat panel display (FPD) manufacturing equipment such as LCDs and PDPs is performed through a series of steps: Removal of organic contamination by UV irradiation of an excimer laser → Wipe cleaning using a roller brush. Removal of pollutants larger than 1 μm → Removal of chemical solution after chemical cleaning by displacement...

Claims

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Application Information

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IPC IPC(8): F25C1/00B08B11/00B08B3/00
CPCB08B3/04B08B11/00C09G1/02G02F1/1303
Inventor 山本悟史
Owner DAINIPPON SCREEN MTG CO LTD
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