Electrical interconnection, method of forming the electrical interconnection, image sensor having the electrical interconnection and method of manufacturing the image sensor

US20050001318A1Inactive Publication Date: 2005-01-06SAMSUNG ELECTRONICS CO LTD
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  • Electrical interconnection, method of forming the electrical interconnection, image sensor having the electrical interconnection and method of manufacturing the image sensor
  • Electrical interconnection, method of forming the electrical interconnection, image sensor having the electrical interconnection and method of manufacturing the image sensor
  • Electrical interconnection, method of forming the electrical interconnection, image sensor having the electrical interconnection and method of manufacturing the image sensor

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Embodiment Construction

[0030] Korean Patent Application No. 2003-44099, filed on Jul. 1, 2003, in the Korean Intellectual Property Office, and entitled: “Metal Wiring, Method of forming the Metal Wiring, Image Sensor Having the Metal Wiring and Method of Manufacturing the Image Sensor,” is incorporated by reference herein in its entirety.

[0031] The present invention now will be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the thickness of layers and regions are exaggerated for clarity. Like reference numerals refer to similar or identical elements throughout. It will be understood that when an elemen...

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Abstract

An electrical interconnection for a highly integrated semiconductor device includes a first insulation layer having at least a first recessed portion on a substrate. The first recessed portion is filled with metal to form a first metal pattern. A diffusion barrier layer including aluminum oxide of high light transmittance is provided on the first insulation layer and the first metal pattern for preventing metal from diffusing. An insulating interlayer including a second recessed portion for exposing an upper surface of the first metal pattern is provided on the diffusion barrier layer. The second recessed portion is filled with metal to form a second metal pattern. The electrical interconnection may be used with an image sensor. The metal may be copper. High light transmittance of the diffusion barrier layer ensures external light reaches the photodetector. The aluminum oxide of the diffusion barrier layer reduces parasitic capacitance of the electrical interconnections.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to an electrical interconnection and a method of forming the electrical interconnection, and to an image sensor having the electrical interconnection and a method of manufacturing the image sensor. More particularly, the present invention relates to an electrical interconnection of copper and a method of forming the electrical interconnection, and to a complementary metal oxide semiconductor (CMOS) image sensor having the electrical interconnection of copper and a method of manufacturing the CMOS image sensor. [0003] 2. Description of the Related Art [0004] The availability and use of information media and equipment for processing information media, e.g., computers, has been steadily increasing. Components using semiconductor technology are under pressure to keep pace with these developments. These developments require semiconductor devices that operate at a high speed and having a larg...

Claims

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Application Information

Patent Timeline
06 Jan 2005
Publication
US20050001318A1
IPC
H01L23/532; H01L21/3205; H01L27/146
CPC
H01L23/53238; H01L23/53295; H01L27/14683; H01L27/14636; H01L27/14601; H01L2924/0002; H01L2924/00; H01L21/3205
Inventors
WON, SEOK-JUN