Porous Polymer and Synthetic Method Thereof
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
example 1
[0179](1) To 1 mL of DMF solution was added bis(1,5-cycloocta-1,5-diene)nickel(0) (1 g), 2, 2′-bipyridyl (0.568 g) and 1,5-cycloocta-1,5-diene (0.4 mL) and the mixture was heated at 50° C. for 0.5 hour;
[0180](2) To the resultant mixture was added 3 mL tetrakis(4-bromophenyl)silane (DMF solution, 0.2M), and stirred at that temperature for 60 hours;
[0181](3) After cooling to room temperature, conc. HCl was added to the reaction mixture;
[0182](4) After filtration the residue was washed with 100 mL hot water, THF, and CHCl3, respectively;
[0183](5) After dried in vacuum at 3-10 mmHg for 10-40 hours at 80-200° C., the pure porous polymer was obtained with 76% yield.
example 2
[0184]The procedure is repeated in a manner similar to that of step (1) of example 1. The reaction mixture was injected into a stainless steel autoclave at 90° C., which yields a polymer with properties very similar to those of the polymer made in example 1.
example 3
[0185]The procedure is repeated in a manner similar to that of example 1. The monomer was changed to tetrakis(4-iodophenyl)methane, which yields a polymer (84% yield) with properties very similar to those of the polymer made in example 1.
PUM
| Property | Measurement | Unit |
|---|---|---|
| Temperature | aaaaa | aaaaa |
| Temperature | aaaaa | aaaaa |
| Temperature | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com



