Microcrystalline-to-amorphous gold alloy and plated film, and plating solution for those, and plated film formation method
a technology of amorphous gold alloy and amorphous gold alloy, which is applied in the direction of cell components, printing, basic electric elements, etc., can solve the problem of not being able to achieve the same degree of durability, and achieve the effect of high electrical conductivity and resistance to cracking
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
example 1
[0063]A mixed microcrystalline-amorphous gold alloy plated film (film thickness 1 μm) was formed on a copper plate having a purity of 99.96% at a temperature of 70° C. and a current density of 10 mA / cm2 using an electroplating solution containing 0.035 mol / dm3 of KAu(CN)2, 0.076 mol / dm3 of NiSO4.6H2O, and 0.21 mol / dm3 of triammonium citrate and having a pH adjusted to 6 with KOH and sulfuric acid. As the anode, a platinum-coated titanium electrode (mesh form) was used, and the plating bath was vigorously stirred during plating.
[0064]The mixed microcrystalline-amorphous gold alloy plated film thus obtained was analyzed by XRD, TEM, and THEED. An XRD pattern is shown in FIG. 1, and TEM images and a THEED pattern are shown in FIGS. 2 to 4. A broad peak having a peak half-width of 1 degree or greater, which is characteristic of being microcrystalline or amorphous, was observed in the XRD pattern at around 2θ=40 degrees. Furthermore, in the TEM image a state in which crystal fringes char...
example 2
[0065]Plating was carried out in the same way as for Example 1 except that n-propanol was added at 20 vol %, and the plated film thus obtained was subjected to XRD, TEM, and THEED analyses. An XRD pattern is shown in FIG. 1, and TEM images and a THEED pattern are shown in FIGS. 5 to 7. A broad peak having a peak half-width of 1 degree or greater, which is characteristic of being microcrystalline or amorphous, was observed in the XRD pattern at around 2θ=40 degrees. Furthermore, in the TEM image a state in which crystal fringes characteristic of being crystalline and an irregular structure characteristic of being amorphous are mixed could be observed. In the THEED pattern, a state in which a diffraction spot characteristic of being crystalline and a halo ring characteristic of being amorphous are mixed could be observed. From these results, it can be seen that the plated film obtained had a mixed microcrystalline-amorphous structure. Furthermore, as a result of examining the TEM imag...
example 3
[0066]Plating was carried out in the same way as for Example 1 except for a concentration of citric acid of 0.143 mol / dm3, a concentration of ammonia of 1.2 mol / dm3, and electroplating being carried out alternatingly at current densities of 1 mA / cm2 (application time 50 sec) and 10 mA / cm2(application time 5 sec) without a gap, and the plated film thus obtained was subjected to XRD, TEM, and THEED analyses. An XRD pattern is shown in FIG. 1, and TEM images and a THEED pattern are shown in FIGS. 8 to 10. A broad peak having a peak half-width of 1 degree or greater, which is characteristic of being microcrystalline or amorphous, was observed in the XRD pattern at around 2θ=40 degrees. Furthermore, in the TEM image a state in which crystal fringes characteristic of being crystalline and an irregular structure characteristic of being amorphous are mixed could be observed. In the TREED pattern, a state in which a diffraction spot characteristic of being crystalline and a halo ring charact...
PUM
| Property | Measurement | Unit |
|---|---|---|
| volume fraction | aaaaa | aaaaa |
| particle size | aaaaa | aaaaa |
| 2θ | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More