Semiconductor device
a technology of semiconductors and semiconductors, applied in the direction of solid-state devices, digital storage, instruments, etc., can solve the problems of increasing the cost per storage capacity, difficult to substantially reduce power consumption, short data holding time, etc., to achieve the effect of reducing power consumption, storing data for an extremely long time, and avoiding the frequency of refresh operation
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embodiment 1
[0061]In this embodiment, a structure and a manufacturing method of a semiconductor device according to one embodiment of the invention disclosed herein will be described with reference to FIG. 1, FIGS. 2A and 2B, FIGS. 3A to 3H, FIGS. 4A to 4G, FIGS. 5A to 5D, FIG. 6, FIGS. 7A and 7B, FIGS. 8A and 8B, and FIGS. 9A and 9B.
[0062]
[0063]FIG. 1 illustrates an example of a circuit configuration of a semiconductor device. The semiconductor device includes a transistor 160 formed using a material which is not an oxide semiconductor, and a transistor 162 formed using an oxide semiconductor.
[0064]Here, a gate electrode of the transistor 160 is electrically connected to one of a source electrode and a drain electrode of the transistor 162. A first wiring SL (a 1st line, also referred to as a source line) is electrically connected to a source electrode of the transistor 160. A second wiring BL (a 2nd line, also referred to as a bit line) is electrically connected to a drain electrode of the tr...
modification example
[0185]FIG. 6, FIGS. 7A and 7B, FIGS. 8A and 8B, and FIGS. 9A and 9B illustrate modification examples of structures of semiconductor devices. The semiconductor devices in each of which the transistor 162 has a structure different from that described above will be described below as modification examples. That is, the structure of the transistor 160 is the same as the above.
[0186]FIG. 6 illustrates an example of a semiconductor device including the transistor 162 in which the gate electrode 136d is placed below the oxide semiconductor layer 140 and the source / drain electrodes 142a and 142b are in contact with a bottom surface of the oxide semiconductor layer 140. Note that the planar structure can be changed as appropriate to correspond to the cross section; therefore, only the cross section is shown here.
[0187]A big difference between the structure in FIG. 6 and the structure in FIG. 2A is the position at which the oxide semiconductor layer 140 is connected to the source / drain electr...
embodiment 2
[0213]In this embodiment, a circuit configuration of a semiconductor device according to one embodiment of the present invention and an operation method thereof will be described.
[0214]FIG. 10 illustrates an example of a circuit diagram of a memory element (hereinafter, also referred to as a memory cell) included in the semiconductor device. A memory cell 200 illustrated in FIG. 10 includes a third wiring 51 (a first signal line), a fourth wiring S2 (a second signal line), a fifth wiring WL (a word line), a transistor 201, a transistor 202, and a transistor 203. The transistor 201 and the transistor 203 are formed using a material which is not an oxide semiconductor and the transistor 202 is formed using an oxide semiconductor. Here, the transistor 201 and the transistor 203 are preferably formed to have a structure similar to that of the transistor 160 in Embodiment 1. In addition, the transistor 202 is preferably formed to have a structure similar to that of the transistor 162 in ...
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