Process for producing vitrification SiO2-Al2O3 mix oxide deposition material

Abstract

The invention relates to a preparation method of crystalloid SiO2-Al2O3 mixed oxide vapor deposition material. SiO2-Al2O3 mixed oxide powders which comprise SiO2 (that is 50 percent to 90 percent by weight percentage) and Al2O3 (that is 10 percent to 50 percent by weight percentage) are deployed; the mixed powders are put in a plumbago pot of a vacuum medium frequency induction furnace; under the vacuum degree that is less than or equals to 1*10<-2>Pa, a medium frequency source is utilized to induce that the plumbago pot is heated until the temperature reaches 1650 to 1750 DEG C to form a SiO2-Al2O3 mixed oxide molten mass; the molten mass is cooled through slow settlement to form pre-fusion crystalloid SiO2-Al2O3 mixed oxide vapor deposition material. Water vapor and residual gas which are generated during the preparation process are gathered by adopting a cold trap drip catcher, and the cryogenic temperature is less than or equals to minus 120 DEG C. The preparation method utilizes a microvacuum medium frequency induction furnace to induce the heating of the plumbago pot, and adopts the slow settlement crystal increasing method to prepare pre-fusion crystalloid SiO2-Al2O3 mixed oxide which is used as starting materials with high purity and high relative density for vapor-plating an advanced optical thin film. The preparation method can shorten the production period and save the manufacturing cost.

Description

technical field [0001] The invention relates to a method for preparing an evaporation coating material, in particular to a crystallized SiO 2 -Al 2 o 3 A method for preparing a mixed oxide evaporation material. Background technique [0002] With the rapid development of the application field of optical coating and the demand for higher performance of optical thin film, in addition to strictly controlling the coating process, the evaporation starting material and its preparation technology have become a very critical issue. For example, it is required that the evaporation material will not have particles splashing during the evaporation process, will not escape gas, and can be used stably and with good repeatability. For this reason, high-purity, high-density, and specific refractive index homogeneous evaporation materials have been continuously developed and applied, especially those mixed oxide evaporation materials that have received great attention, such as La-Ti, La-A...

AI Technical Summary

Problems solved by technology

Therefore, before evaporation, it must be fully melted with an electron beam in the crucible of the vacuum chamber to prevent the splashing of tiny particles and eliminate the residual gas contained in the material. The operation is cumbersome, the coating cycle is prolonged, and the production cost is increased.

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