Continuous-surface shape mask moving photoetching exposure device

Abstract

The continuous surface mask mobile lithography exposure device includes a host large substrate, a mask mobile workbench system, a uniform lighting system, a mask frame, a mask, a substrate, an alignment observation system, a substrate lifting platform system, and an illumination system. Uniformity detection system and control system, the mask mobile table system and illumination uniformity detection system are respectively fixed on the large substrate of the host machine, the mask mobile table system is composed of XY manual table and XY mask mobile table, XY mask A mask frame is supported on the mobile platform, the mask frame is adsorbed on the mask, the substrate is adsorbed on the substrate lifting platform system, the uniform illumination system is located above the mask frame and the mask, and the alignment observation system is connected to On one side of the uniform lighting system, the detection output signals of the workbench system, the uniform lighting system and the lighting uniformity detection system are sent to the control system for processing and used for closed-loop control. The invention has the function of mask moving exposure photolithography, and is easy to operate and use.

Description

technical field [0001] The invention relates to a continuous surface-shaped mask mobile photolithography exposure device, which belongs to the technical field of producing arbitrary continuous surface-shaped relief structures and microlens array structures by photolithography exposure. Background technique [0002] With the wide application of micro-optical components and the substantial increase in demand, it is urgent to improve and perfect the fabrication technology of micro-optic components to improve their quality and output. This requires a relatively perfect method and corresponding production equipment. Summarize the existing methods of manufacturing micro-optical elements and micro-structured optical elements can be divided into two categories: one is the use of gray-scale mask, optical lithography, electron beam lithography, ion beam lithography, laser beam direct writing and other methods Fabrication of multi-step binary microstructured optical elements. At pres...

AI Technical Summary

Problems solved by technology

However, the existing moving mask lithography equipment is extremely simple and pieced together from a certain part of other devices or equipment. At the same time, there are deficiencies in many aspects such as production function, production accuracy and ease of operation. The continuous surface shape of the produced components is not smooth enough, and the quality and production efficiency of continuous surface components cannot be greatly improved.

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