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Infiltration photo-etching system, infiltration photo-etching method for patterned semiconductor integrated circuit

A lithography system and patterning technology, used in the field of immersion lithography and immersion lithography systems

Active Publication Date: 2010-07-21
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, today's immersion lithography processes experience various contamination and particles from wafers and components of the lithography system, resulting in pattern defects, pattern distortion, and pattern loss
Therefore, it is also a big challenge to effectively monitor the particles in the immersion lithography process.

Method used

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  • Infiltration photo-etching system, infiltration photo-etching method for patterned semiconductor integrated circuit
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  • Infiltration photo-etching system, infiltration photo-etching method for patterned semiconductor integrated circuit

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Embodiment Construction

[0069] figure 1 An immersion lithography apparatus with a particle monitoring mechanism according to a preferred embodiment of the present invention is shown, which shows an immersion lithography apparatus 100 according to a preferred embodiment of the present invention, and the substrate 110 is subjected to immersion lithography processing therein. The above-mentioned substrate 110 may be a semiconductor wafer, which has a basic semiconductor, a compound semiconductor, an alloy semiconductor, or a combination thereof. The aforementioned substrate may include one or more layers of materials, such as polysilicon, metal, and / or dielectric materials. The above-mentioned substrate may include other materials, for example, a glass substrate used to make a thin film transistor liquid crystal display (TFT-LCD) element, or a fused silica substrate used to make a mask. A patterned layer 115 may also be included above the substrate. The patterned layer 115 may be a photosensitive photo...

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Abstract

The invention provides a system which effectively and efficiently monitors grains in an immersion lithography process. The immersion lithography system includes a focus lens system having a front face, a board stage laid down under the front face of the focus lens system, an immersion fluid holding module which has a fluid inlet and a fluid outlet, is provided to hold fluid from the fluid inlet to cause the fluid to at least partially fills a gap between the front face and a board on the board stage, and causes the fluid to flow through the fluid outlet to the outside, and a grain monitoring module which is combined with the immersion fluid holding module.

Description

technical field [0001] The invention relates to an immersion photolithography system and an immersion photolithography method for patterning semiconductor integrated circuits. Background technique [0002] Immersion lithography usually uses deionized water filled between the projection lens and the photoresist layer to expose the coated photoresist and form a pattern to obtain higher resolution. Today's immersion lithography processes can include many process steps, such as photoresist coating, pre-bake, immersion exposure, post-exposure bake, development, and hard bake. However, today's immersion lithography processes experience various contamination and particles from wafers and components of the lithography system, resulting in pattern defects, pattern distortion, and pattern loss. So it is also a big challenge to effectively monitor the particles in the immersion lithography process. Contents of the invention [0003] Based on the purpose of solving the above prob...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/70341G03B27/42G03F7/70916
Inventor 傅中其徐树彬张秀玉
Owner TAIWAN SEMICON MFG CO LTD