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Construction method for composite pattern having both micron and nano structures

A micro-nano and construction method technology, applied in the field of micro-nano material preparation, can solve problems that have not been seen before, achieve the effects of saving equipment and instruments, widening the range of raw material selection, and simple and easy methods

Inactive Publication Date: 2008-04-09
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

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Method used

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  • Construction method for composite pattern having both micron and nano structures
  • Construction method for composite pattern having both micron and nano structures

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] 1. Treatment of the substrate

[0024] Boil the glass sheet substrate in a mixed solution containing concentrated sulfuric acid and hydrogen peroxide for half an hour. The mass ratio of concentrated sulfuric acid and hydrogen peroxide is 7:3, then place it in acetone for 30 minutes, rinse it with deionized water, and dry it. .

[0025] 2. Prepare the solution of linear copolymer, crosslinker and photoinitiator

[0026] Select the linear random copolymer PS-r-PMMA, the crosslinking agent is TMPTA (trimethylolpropanetriacrylate), the photoinitiator is 2,2'-dimethoxy-2-phenylacetophenone, and the above three substances are dissolved in In chloroform, the solid content of the solution is 1%, wherein PS-r-PMMA:TMPTA (mass ratio)=5:3, and the photoinitiator accounts for 5% of the mass sum of the random copolymer and TMPTA.

[0027] 3. Spin coating film formation

[0028] The solution was spin-coated on a spin coater to form a film. The selected rotational speed was 1.2krad...

Embodiment 2

[0034] 1. Treatment of the substrate

[0035] Boil the glass substrate in a mixed solution containing concentrated sulfuric acid and hydrogen peroxide for 1 hour. The mass ratio of concentrated sulfuric acid to hydrogen peroxide is 10:1, then place it in acetone for 15 minutes, rinse it with deionized water, and dry it. .

[0036] 2. Prepare the solution of linear copolymer, crosslinker and photoinitiator

[0037] Select the linear random copolymer PS-r-PEMA, the crosslinking agent is TMPTA (trimethylolpropanetriacrylate), the photoinitiator is isopropyl thioxanthone, and the above three substances are dissolved in toluene, and the solid content of the solution is 5%. , wherein PS-r-PEMA: TMPTA (mass ratio) = 1: 1, the photoinitiator accounts for 10% of the sum of the mass of the random copolymer and TMPTA.

[0038] 3. Spin coating film formation

[0039] The solution was spin-coated on a spin coater to form a film. The selected rotational speed was 1.5krad / min for the firs...

Embodiment 3

[0045] 1. Treatment of the substrate

[0046] Boil the glass substrate in a mixed solution containing concentrated sulfuric acid and hydrogen peroxide for half an hour. The mass ratio of concentrated sulfuric acid and hydrogen peroxide is 1:1, then place it in acetone for 15 minutes, and finally rinse it with deionized water and dry it. .

[0047] 2. Prepare the solution of linear copolymer, crosslinker and photoinitiator

[0048] Choose linear random copolymer PS-r-PBMA, cross-linking agent is 2,2-bis(4-acrylate pentaethoxy) phenyl-propane, photoinitiator is benzophenone, above-mentioned three kinds The substance is dissolved in 1,1,2-trichloroethane, the solid content of the solution is 1%, wherein PS-r-PBMA:crosslinking agent (mass ratio)=3:5, photoinitiator accounts for random copolymer and 5% of the sum of the mass of the crosslinking agent.

[0049] 3. Spin coating film formation

[0050] The solution was spin-coated on a spin coater to form a film. The selected rota...

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Abstract

The invention relates to a constructing method of a composite figure with micron and nanometer structures. Through the combination of the photoetching technique and the reactivity isolation technique, a figure with the micron and nanometer structures synchronously is prepared to be used in an integrative breadboard, an information storage device, a biochip and a micro electromechanical system. First, oil of vitriol and acetone are used to dispose the surfaces of glass uropatagia or silicon uroopatagia; second, solution with a certain consistency is prepared by cross linker, linear multipolymer, and light evocating agent and then is rotated and coated into a film on the surface of the uropatagia; third, the prepared film is performed with photoetching, developing, and then a micron-level figure is made; fourth, the micron-level figure is further quenched, thereby a nanometer-level figure is formed on the surface of the micron-level figure, and a compound figure with micron-level and nanometer-level structures synchronously is obtained. The invention has the advantages that the method is simple and is easy to be operated, the micron-level figure and the nanometer-level figure can be prepared synchronously, and a plurality of equipment and instruments can be saved.

Description

technical field [0001] The invention relates to a method for constructing a composite pattern with a micro-nano structure, which is particularly suitable for constructing a composite pattern with a micro-nano structure by using materials with photocuring characteristics and random copolymers, and belongs to the technical field of micro-nano material preparation. Background technique [0002] As an important technology, the preparation of micro- and nano-patterns has been paid more and more attention by researchers because of its wide application in integrated circuit boards, information storage devices, biochips and micro-electromechanical systems. In order to find a set of simple and effective ways to prepare micro-nano-scale patterns, researchers from various countries have developed a variety of methods such as: laser photochemical deposition (LCVD), microcontact printing (μCP), photolithography and self-assembly. Among all these methods, photolithography is the only meth...

Claims

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Application Information

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IPC IPC(8): C03C17/00C03C15/00C04B41/45C04B41/53
Inventor 纪强姜学松印杰
Owner SHANGHAI JIAO TONG UNIV
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