Non-equilibrium liquid condition composite pulse plasma polishing method

A technology of polishing liquid and aqueous solution, applied in the field of polishing treatment of metal materials and ion polishing, can solve the problems of difficult mechanical polishing of workpieces, high labor intensity of workers, high power consumption, etc., to avoid surface ablation of workpieces, process Easy to control, good mirror effect

Inactive Publication Date: 2008-05-07
XIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] There are many disadvantages in mechanical polishing: the noise pollution is very large; the dust generated during polishing makes the working environment particularly bad; the labor intensity of workers is high; and mechanical polishing can only be used to process regular workpieces, and it is difficult to mechanically polish workpieces with slightly complicated shapes. ; work efficiency is low
But this method requires high current and voltage, so it consumes a lot of power.

Method used

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  • Non-equilibrium liquid condition composite pulse plasma polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] Workpiece to be processed: 304 stainless steel sheet

[0044] The preparation polishing liquid is: the concentration of formula A is 3% (NH 4 ) 2 SO 4 Aqueous solution, formula B concentration is 1% ammonium citrate aqueous solution, formula A and formula B are mixed, solution temperature is 90 ℃.

[0045] Eight identical 304 stainless steel sheets were divided into two groups, and polished under different conditions by direct current and pulse respectively:

[0046] DC 1: voltage 200V, temperature 90°C, time 2 minutes.

[0047] DC 2: voltage 250V, temperature 90°C, time 2 minutes.

[0048] DC 3: voltage 300V, temperature 90°C, time 2 minutes.

[0049] DC 4: voltage 350V, temperature 90°C, time 2 minutes.

[0050] Pulse 1: voltage 200V, temperature 90°C, time 2 minutes, frequency 10KHz, duty cycle 50%.

[0051] Pulse 2: voltage 250V, temperature 90°C, time 2 minutes, frequency 10KHz, duty cycle 50%.

[0052] Pulse 3: voltage 300V, temperature 90°C, time 2 minute...

Embodiment 2

[0057] Workpiece to be processed: 304 stainless steel sheet

[0058] Prepare the polishing liquid as: the concentration of component A is 6% (NH 4 ) 2 SO 4 Aqueous solution, the concentration of component B is a mixed aqueous solution of 2% EDTA and 1% sodium oxalate, component A and component B are mixed, and the solution temperature is 95°C.

[0059] Four identical 304 stainless steel sheets were divided into two groups, and polished under different conditions with DC pulse and composite electric pulse respectively:

[0060] DC pulse 1: voltage 280V, frequency 80KHz, duty cycle 95%, time 2 minutes.

[0061] DC pulse 2: voltage 350V, frequency 80KHz, duty cycle 95%, time 2 minutes.

[0062] Composite pulse 1: Positive pulse voltage 280V, frequency 80KHz, duty cycle 95%, negative pulse voltage 100V, time 2 minutes.

[0063] Composite pulse 2: Positive pulse voltage 350V, frequency 80KHz, duty cycle 95%, negative pulse voltage 100V, time 2 minutes.

[0064] The above-ment...

Embodiment 3

[0068] Workpieces to be treated: white copper (containing 7% nickel), titanium

[0069] Prepare the polishing liquid as follows: the concentration is 1% (NH 4 ) 2 SO 4 And concentration is 3% ammonium citrate aqueous solution, solution temperature 90 ℃.

[0070] Under DC pulse and compound pulse treatment respectively:

[0071] DC pulse: voltage 350V, frequency 0.5KHz, duty cycle 50%, time 2 minutes.

[0072] Composite pulse 2: Positive pulse voltage 350V, frequency 0.5KHz, duty cycle 50%, negative pulse voltage 100V, time 2 minutes.

[0073] The above-mentioned composite electric pulse adopts the waveform in the accompanying drawing d, wherein m:n=2:1.

[0074] Table 3 Comparison of pulse polishing and compound electric pulse polishing

[0075] Cupronickel

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Abstract

A polishing solution disclosed by the present invention is composed of the following components according to mass percentage: component A: (NH4)2SO4 aqueous solution with a concentration of 1% to 10%, component B: ethylene glycol with a concentration of 0.2% to 3% One or a combination of amine tetraacetic acid, ammonium citrate, sodium tartrate or sodium oxalate. The method of using the polishing liquid to carry out non-equilibrium liquid compound pulse plasma polishing, first prepare the polishing solution according to the above formula, then put the workpiece to be treated into the above prepared polishing liquid, add a compound electric pulse or an equivalent different Combination of positive and negative pulses, control positive pulse frequency 0.5-80kHz, duty cycle 5%-95%, voltage 200-480V, make the reaction in the most violent state, treatment for 1-5 minutes, that is to complete the polishing process. In the present invention, pulses are used instead of direct current, which is beneficial to the generation of plasma, so that the discharge plasma can obtain higher kinetic energy, better mirror effect and faster polishing speed.

Description

technical field [0001] The invention belongs to the technical field of surface treatment and surface modification of metal materials, and relates to a polishing liquid composition for surface treatment of metal materials, especially for the polishing treatment of stainless steel, titanium, aluminum alloy, magnesium alloy, copper and other metal materials. The invention also relates to a method for using the polishing liquid to perform non-equilibrium liquid compound pulse plasma polishing on the metal material. Background technique [0002] Polishing can be used as the terminal process of surface treatment of metal structural parts and decorative parts to effectively improve their surface properties and enhance the decorative effect. It can also be used as the pre-process of various (including special functions) surface modification technologies, making the follow-up treatment very simple. convenient. [0003] At present, the commonly used polishing processes mainly include...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/00
CPCC25F3/18C25F3/20C25F3/22C25F3/24C25F3/26
Inventor 孙强陈桂涛侯磊王阳张云安
Owner XIAN UNIV OF TECH
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