A structure of semiconductor luminous device with wide spectrum photo-emission function
A light-emitting device and wide-spectrum light technology, which is applied to semiconductor devices, electrical components, circuits, etc., can solve problems such as instability, drastic changes in emission spectrum, and reduced structural luminescence performance, to eliminate phase separation, reduce point defects, reduce The effect of the small piezoelectric effect
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[0025] The examples illustrate the implementation of the invention, but the implementation of the invention is not limited to the implementation of the examples. Fig. 1 In the device structure of the present invention: 1 top layer nitride: such as p-GaN, 2 multilayer active region: such as InGsN quantum well, 3 bottom layer nitride: such as n-GaN, 4 transition layer: such as low temperature GaN, 5 lining Bottom material: such as sapphire.
[0026] The present invention utilizes the MOCVD (metal organic chemical vapor phase epitaxy) epitaxial growth system, adopts the method of synthesizing the multi-quantum well structure of nitride semiconductor with multi-energy level recombination function, and obtains the multi-energy level wide-spectrum light spectrum with nitride semiconductor as the basic material. emission. Specifically include the following steps:
[0027] 1. Surface cleaning and treatment of sapphire (0001) substrate. Clean the sapphire (0001) substrate with trich...
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