Production method of nucleus micropore filtering film of optimizing flow passage

A technology of microporous filtration membrane and manufacturing method, which is applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve the problems such as poor selection of filtration membranes, and achieve small filtration flow resistance, high filtration speed, and high retention high efficiency effect

Active Publication Date: 2008-08-27
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the porosity increases, adjacent track-etched pores will overlap and merge into multiple pores with a diameter larger than that of a single pore and irregular shapes, which will deteriorate the selectivity of the filter membrane.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] 1) Irradiate a 15-micron-thick polyester (PET) insulating film with reactor fission fragments of uranium-235 target fission caused by reactor thermal neutrons, and the irradiation density is 2×10 5 track / cm 2 ;

[0022] 2) Coat a layer of solvent-based release agent on the irradiated polyester insulating film (available in chemical stores, The model is SLX or 518A release agent or other types of release agent are acceptable); Among them, the thickness of the coated solvent-based release agent is 12 μm, and the coating thickness is about 4 μm after the solvent evaporates.

[0023] 3) Coating a 20 μm thick self-adhesive on the BOPP film, and cold-compositing the BOPP film coated with the self-adhesive with the above-mentioned insulating film coated with a layer of solvent-based release agent to form a composite film;

[0024] 4) Etching the composite film at 70°C for 30 minutes in 6.25N NaOH solution, that is, etching the irradiated insulating film on one side to form n...

Embodiment 2

[0031] 1) The reactor fission fragments of the uranium-235 target fission caused by reactor thermal neutrons are irradiated with a 12-micron thick polycarbonate (PC) insulating film, and the irradiation density is 1.25×10 9 track / cm 2 ;

[0032] 2) Coat a layer of acrylic ester on the irradiated insulating film with a three-drying tunnel coating machine at the drying tunnel temperatures of 40°C, 50°C, and 45°C; wherein, the thickness of the coated acrylic ester is 10 μm, After the solvent evaporates, the coating thickness is about 3.5 μm.

[0033] 3) Coating a 10 μm thick self-adhesive on the BOPP film, and cold-compositing the BOPP film coated with the self-adhesive with the above-mentioned insulating film coated with a layer of acrylic ester to form a composite film;

[0034] 4) In 8N NaOH solution, etch at 50°C for 25 minutes to etch the composite film, that is, single-sided etching of the irradiated insulating film to form non-biconical micropores;

[0035] 5) Wash the ...

Embodiment 3

[0040] 1) The energy accelerated by the accelerator is 10MeV / u, 40 30 μm thick polyester (PET) insulating film was irradiated with Ar, and the irradiation density was 1×10 4 track / cm 2 ;10MeV / u: means 10 MeV / nucleon (including protons and neutrons)

[0041] 2) Coat a layer of cellulose multi-mixed resin on the irradiated insulating film with a three-drying tunnel coating machine at the drying tunnel temperatures of 50°C, 65°C, and 55°C; wherein, the coated cellulose is mostly The thickness of the mixed resin is 15 μm, and the coating thickness is about 5 μm after the solvent evaporates.

[0042] 3) Coating 25 μm thick self-adhesive on the BOPP film, and cold-compositing the BOPP film coated with self-adhesive with the above-mentioned insulating film coated with a layer of cellulose multi-mixed resin to form a composite film;

[0043] 4) Etching the composite film at 80°C for 45 minutes in 5.5N NaOH solution, that is, etching the irradiated insulating film on one side to for...

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PUM

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Abstract

The invention discloses a manufacturing method of a nucleopore filtration film to optimize flow passages in the technology field of liquid filtration. The manufacturing method is that a heavy ion accelerator or a reactor is used to radiate an insulation film and radiation damage is formed inside the insulation material; a solvent type release layer is coated on the insulation film; an alkalifast adhesive film is compounded on the surface of the release layer at low temperature to form a composite film; subsequently, under the optimized etching condition, the composite film is etched on one side under the protection of the adhesive film, thus forming non-biconical micropores; the release layer is stripped off at ordinary temperature; the microporous film is washed in de-ionized water before the composite film is dried. The microporous film made by using the method can have the thickness more than 10 micrometers, the opening rate on the upper surface of the film less than 1 percent and the porosity on the lower surface more than 10 percent. When the microporous film is used for liquid filtration, the flow resistance is small, the flow is large, granules are unlikely to be absorbed and cause dead end filtration. The method provided by the invention is applicable for producing films in batch; the process is well-developed; product quality is controlled easily and the cost is low.

Description

technical field [0001] The invention belongs to the technical field of liquid filtration, and in particular relates to a method for manufacturing a nuclear microporous filtration membrane with optimized flow channels. Background technique [0002] Both water and common chemical reagents contain more or less invisible solid particles, which often cause harm to industrial production and human health. At present, microporous membrane filtration technology is usually used to remove the above-mentioned solid particles. However, this microporous membrane is not a nuclear pore membrane with a single pore size. [0003] In the microelectronics industry, the wire width and spacing of modern components are on the order of microns. If the raw materials for making components contain micron-sized dust particles, it will cause wire breakage or short circuit. Or circuit parameters will change, making tens of thousands of electronic components. The components become waste products; anothe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D67/00
Inventor 王玉兰徐世平陈靖张泉荣严玉顺王炜邢宾杰张伟王国欣樊诗国
Owner TSINGHUA UNIV
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