Manufacturing method for floating type micro-silicon electrostatic gyro/accelerometer sensitive structure
A technology of accelerometer and sensitive structure, which is applied in the manufacture of microstructure devices, velocity/acceleration/impact measurement, microstructure technology, etc. It can solve the problems of prototypes without forming principles and achieve easy-to-achieve effects
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[0038] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings.
[0039] Using this process has successfully flowed out the die, such as figure 1 As shown, the planar size of the die is on the order of millimeters, and the thickness is on the order of microns, and the die is packaged with a CQFP, DIP or PLCC shell. This sensitive structure process requires 8 masks, and Table 1 describes the definition of masks in detail.
[0040] Table 1 Definition of the mask plate required for the process
[0041]
[0042] Figure 6 It is a schematic diagram of the process flow of the present invention. In conjunction with the mask plate required for the process in Table 1, the present invention is described as follows:
[0043] 1. Glass etching process and gold sputtering process; standard cleaning of glass, coating of photoresist and photolithography of bottom and top glass according to meml-1 and meml-2 masks,...
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