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Target material for preparing transparent conductive film and method for preparing conductive film and electrode

A technology of transparent conductive film and manufacturing method, applied in metal material coating process, ion implantation plating, coating and other directions, can solve problems such as depletion and depletion, and achieve the effects of fast corrosion rate, low resistivity and small corrosion

Inactive Publication Date: 2008-10-15
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Since indium ore is a rare resource, a large amount of consumption will inevitably lead to depletion

Method used

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  • Target material for preparing transparent conductive film and method for preparing conductive film and electrode
  • Target material for preparing transparent conductive film and method for preparing conductive film and electrode
  • Target material for preparing transparent conductive film and method for preparing conductive film and electrode

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] On glass with a thickness of 0.63mm, a 600nm thick Al alloy film was deposited by DC magnetron sputtering AZO ceramic target. During the preparation of the ceramic target, the content of Al-containing elements is controlled at 1at%-10at%, and the content of O2 and the pressure and power of the working gas Ar are controlled. The resistivity of the prepared film was measured by 4-point method at room temperature. Then measure the light transmittance with a spectrophotometer. Test results such as Figure 1-Figure 9 .

[0034] figure 1 It is the X-ray diffractogram of the AZO film prepared when the substrate temperature is 150°C. from figure 1 It can be seen that its structure is consistent with that of ZnO. Although there is Al doping, the basic structure has not changed.

[0035] figure 2 It is the transmittance spectrum of AZO film when doped with different oxygen. from figure 2 It can be seen that for the O2 content in the working gas ranging from 0-4%, the t...

Embodiment 2

[0043] The AZO target is evaporated by electron beam, and the transparent conductive film is deposited on the glass substrate or other media.

Embodiment 3

[0045] If the FPD transparent conductive electrode is prepared, the AZO thin film is first deposited on the glass substrate by magnetron sputtering, and then it is masked by a mask and patterned by photolithography, and then etched to become an electrode.

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Abstract

The invention discloses a target for manufacturing a transparent conductive film. The target is AZO ceramics, wherein the content of Al element ranges between 1 at percent and 10 at percent, and the balance is ZnO. The invention also discloses a method for manufacturing the transparent conductive film and a method for manufacturing a transparent conductive electrode. The invention manufactures a binary ceramic target through replacing In and Sn which are scarce and expensive by Al and Zn which are abundant, and deposits a film on a substrate by a method of magnetron sputtering or electron beam evaporating AZO target. The product is used as an FPD transparent conductive electrode after photolithography and etching. The method can reduce cost and obtain the transparent conductive film and the transparent conductive electrode which are low in resistivity, and good in visible light transmittance and in resistance of reduction of plasma.

Description

technical field [0001] The present invention relates to a target material used in the preparation of a transparent conductive film, and a method for making a transparent conductive film and a transparent electrode using the target material, in particular to a target material used in the preparation of a transparent conductive film containing a thin film transistor liquid crystal display (TFT LCD), and A method for making a transparent conductive film and an electrode by using the target material. Background technique [0002] Transparent conductive oxide (TCO for short) is the most widely used category among all transparent conductive materials. Because the film prepared by this material not only has a high transmittance in the visible light region, but also has a high reflectivity in the infrared and near-infrared regions, and the resistivity of the film is also very low. Therefore, it can be used not only as a flat electrode material for flat panel displays (FPD) and sola...

Claims

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Application Information

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IPC IPC(8): C23C14/08C23C14/35C23C14/54C23C14/28
Inventor 薛建设林承武梁珂
Owner BOE TECH GRP CO LTD
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