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Wastewater treatment system and method

A wastewater treatment system and wastewater treatment technology, which are applied in the fields of metallurgical wastewater treatment, neutralized water/sewage treatment, oxidized water/sewage treatment, etc., can solve the problems of ceramic membrane pore blockage, shortened service life, and enlarged pore size, etc. To achieve the effect of reducing processing cost, improving performance and reducing time

Inactive Publication Date: 2008-11-19
POWERCHIP SEMICON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although this technology can effectively separate the particles in the water, the particles in the chemical mechanical grinding wastewater are high-hardness particles, which can easily cause the pores of the ceramic membrane to be blocked, and the pore size will become larger due to long-term friction, resulting in a significant shortening of the service life.
In addition, the treatment cost of using ceramic membrane filtration method will be much higher than that of chemical coagulation and dosing method

Method used

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  • Wastewater treatment system and method
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Examples

Experimental program
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Effect test

experiment example 1

[0089] Mix chemical mechanical grinding waste water and crystal back grinding waste water with the ratio of water volume 5: 1, after the waste water treatment system of the present invention and method thereof are processed, the suspended solid content measured in the mixed waste water can be made from 245mg / L decreased to below 3mg / L after treatment; and the content of silicon dioxide also decreased from 731mg / L before treatment to 210mg / L after treatment. In addition, the conductivity of mixed wastewater increased from 76 μS / cm before treatment to 108 μS / cm after treatment.

experiment example 2

[0091] The chemical mechanical grinding wastewater and the crystal back grinding wastewater are mixed in the ratio of water amount 3: 1. After being treated by the wastewater treatment system and its method of the present invention, the suspended solids content measured from the mixed wastewater is from 386 mg / L before the treatment. Reduced to below 3mg / L after treatment; and the content of silicon dioxide also decreased from 1078mg / L before treatment to 320mg / L after treatment. In addition, the conductivity of mixed wastewater increased from 68 μS / cm before treatment to 101 μS / cm after treatment.

[0092] To sum up, the waste water treatment system and its method of the present invention increase the particle size by changing the type and distribution of particles in the waste water, which is beneficial to the coagulation reaction. And after adding the coagulant, the hydrogen peroxide and ammonia are removed by aeration, which can improve the disturbance of sludge settlement...

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Abstract

The invention discloses a wastewater treatment method, which is applicable to the treatment of chemical mechanical polishing wastewater, wherein, the chemical mechanical polishing wastewater contains hydrogen peroxide and ammonium ions. Firstly, alkaline solution is added into the chemical mechanical polishing wastewater to adjust and control a pH value of the chemical mechanical polishing wastewater; then coagulant aid is added into the chemical mechanical polishing wastewater; and an aeration step is performed to remove the hydrogen peroxide and the ammonium ions so as to reduce the interference of chemical settlement.

Description

technical field [0001] The present invention relates to a wastewater treatment system and its method, and in particular to a chemical mechanical polishing (CMP) wastewater treatment system and its method. Background technique [0002] The wastewater generated in the semiconductor manufacturing process includes etching wastewater, reverse osmosis wastewater and chemical mechanical grinding wastewater, among which chemical mechanical grinding wastewater can be said to be one of the most difficult wastewater to treat. Due to the complex composition of chemical mechanical grinding wastewater, the particle size of nano-scale particles in wastewater is very small, and the concentration of particles is not high, chemical mechanical grinding wastewater is not easy to treat. [0003] Generally speaking, chemical mechanical grinding wastewater can be mainly divided into metal chemical mechanical grinding wastewater and oxide film chemical mechanical grinding wastewater. The chemical ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F9/04C02F7/00C02F1/74C02F1/52C02F1/66C02F103/16C02F101/10C02F101/16
CPCY02W10/10
Inventor 黄政忠宋坤森林志鸿
Owner POWERCHIP SEMICON CORP