Fluorosilicate self-cleaning glass nanophase material and producing method thereof

A technology of nanomaterials and production methods, applied in the field of silicon fluoride self-cleaning glass nanomaterials, can solve the problems of complex production process, high cost, and relatively high temperature requirements for curing and film formation, and achieves simple construction, stable product performance, and good resistance. The effect of UV aging properties

Active Publication Date: 2008-12-31
GUANGZHOU BAIYUN CHEM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these are all on-line production methods for hydrophilic self-cleaning glass, the production process is complicated, the cost is high, and most of them require relatively high temperature for curing and forming a film, and it is difficult to carry out the process on the wall glass (or used glass). Self-cleaning treatment for surface modification

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The production method of silicon fluoride self-cleaning glass nanomaterials in this embodiment includes the following two steps:

[0032] 1) Synthesis of silica nanoparticles

[0033] 500 parts of ethanol was placed in the reactor as a solvent and stirred, and 15 parts of water was added. Then add concentrated ammonia water to adjust the pH value of the system to 10. At a reaction temperature of 40°C, 15 parts of ethyl orthosilicate was added into the reactor, and the hydrolysis reaction was carried out for 1.0 h.

[0034] 2) Surface modification of silica nanoparticles

[0035] The pH value of the above reaction system was adjusted to 6.0 with dilute hydrochloric acid, 1.5 parts of tridecafluorooctyltrimethoxysilane was added, and the reaction was continued at 35° C. for 6 h to obtain a light blue solution. The pH value of the reaction system is adjusted to 7.0 with ammonia water, and the reaction product is filtered to obtain the fluorinated modified silicone nano ...

Embodiment 2

[0038] The production method of silicon fluoride self-cleaning glass nanomaterials in this embodiment includes the following two steps:

[0039] 1) Synthesis of silica nanoparticles

[0040] 500 parts of ethanol was placed in the reactor as a solvent and stirred, and 15 parts of water was added. Then add concentrated ammonia water to adjust the pH value of the system to 10. At a reaction temperature of 50° C., 15 parts of ethyl orthosilicate was added into the reactor, and the hydrolysis reaction was carried out for 0.8 h.

[0041] 2) Surface modification of silica nanoparticles

[0042] Adjust the pH of the above reaction system to 5.0 with dilute hydrochloric acid, add 1.5 parts of tridecafluorooctyltrimethoxysilane, and continue the reaction at 40°C for 4 hours to obtain a light blue solution, adjust the pH of the reaction system with sodium hydroxide The value is 5.0, and the reaction product is filtered to obtain the fluorinated modified silicone nano coating.

[0043] ...

Embodiment 3

[0045] The production method of silicon fluoride self-cleaning glass nanomaterials in this embodiment includes the following two steps:

[0046] 1) Synthesis of silica nanoparticles

[0047] Put 500 parts of ethanol as a solvent in the reactor and stir, add 8 parts of water, and then add sodium hydroxide to adjust the pH value of the system to 12.5. At the reaction temperature of 38°C, 8 parts of ethyl orthosilicate was added into the reactor, and the reaction was stirred for 0.5h.

[0048] 2) Surface modification of silica nanoparticles

[0049] Adjust the pH value of the above silica reaction system to 5.0 with acetic acid, add 2.5 parts of heptadecafluorodecyltriethoxysilane, and continue stirring at a reaction temperature of 40° C. for 3.5 hours to obtain a light blue solution. The pH value of the reaction system is adjusted to 7.0 with ammonia water, and the reaction product is filtered to obtain the fluorinated modified silicone nano coating.

[0050] The coating prep...

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Abstract

The invention discloses a silicon fluoride self-cleaning glass nano-material, which is composed of solvent and active ingredients; the active ingredients are fluorinated modified silicone nano-particles, and the reaction raw materials comprise ortho-silicon ester and fluorine modified alkyl silane, with the ratio volume and dosage reaching 1.5-3:0.15-1.8. The invention also discloses a manufacturing method for the silicon fluoride self-cleaning glass nano-material, comprising two steps: synthesizing the surface modification of silica nano-particles, silica nano-particles; the ratio between volume and dosage for each added reactant is as follows: solvent: water: ortho-silicon ester: fluorine modified alkyl silane equals to 100: 1.5-3: 1.5-3: 0.15-1.8. The invention has simple production process, stable product performance, higher storage stability, excellent chemical properties, low surface energy and good tolerance against pollution, which is used for glass surface treatment; the contact angle between water and coating is greater than 110 degrees.

Description

technical field [0001] The invention relates to a silicon fluoride self-cleaning glass nano material used for surface treatment of glass, ceramics, etc. to make the surface have dustproof, antifouling and self-cleaning functions and a production method thereof. Background technique [0002] With the continuous development of the modernization of urban construction, the amount of glass curtain walls used in high-rise buildings has increased rapidly. But at present, most of the glass curtain walls have the problem of poor pollution resistance, especially in the northern regions with severe air pollution, drought and little rain, the glass curtain walls are very easy to be dusty, resulting in uneven color and different ripples, making Uncontrollable light reflection leads to cluttered light environment and damages the urban landscape. In addition, it is very difficult to clean the glass curtain wall. The high-strength detergent used in the cleaning process is corrosive to a ce...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/30
Inventor 许京丽欧阳喜仁诸泉陈建军
Owner GUANGZHOU BAIYUN CHEM IND
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