Elemental oxygen degradation resistant polyimide material and method of producing the same
A technology of polyimide and anti-atomic oxygen, applied in the field of organic-inorganic hybrid polyimide materials and their preparation
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0019] At room temperature, in a three-necked bottle, first fully dissolve 30.83g of phosphorus-containing diamine monomer DAPPO in N,N'-dimethylacetamide (DMAc), and then add in batches when the solution is clear and no particles are seen. 3,3',4,4'-biphenyldianhydride (BPDA) with the amount of diamine and other substances. After stirring and reacting for about 4 hours, 22.1 g of tetraethyl orthosilicate (TEOS) was added as an inorganic component, and stirring was continued for 8 hours to obtain a uniform and viscous precursor polyamic acid (PAA) solution.
[0020] Apply the precursor solution to clean glass, scrape out a layer of liquid film about 0.25mm thick with a glass rod wrapped with copper wire, and place it horizontally in a far-infrared drying oven to achieve imide through temperature programming control. The heating program is: 60°C / 1h, 80°C / 1h, 120°C / 1h, 150°C / 1h, 200°C / 1h, 250°C / 1h, 300°C / 1h, after cooling to room temperature, the film is removed to obtain Polyi...
Embodiment 2
[0031] Change the quality of the inorganic component ethyl orthosilicate to 44.2g, and the others are the same as in Example 1.
Embodiment 3
[0033] Change the inorganic component into 19.3g tetra-n-butyl zirconia, and the others are the same as in Example 1.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com