Structure of nanometer line cold-cathode electron source array with grid and method for producing the same as well as application of flat panel display

Abstract

The invention discloses a structure of a nano-wire cold cathode electron source array with a grid electrode, and a production method and an application thereof in flat panel display. The electron source array structure comprises a substrate, a cathode electrode strip and a grid electrode strip which are mutually crossly arranged and produced on the substrate, an insulating layer between a cathode and the grid electrode, and a nano-wire cold cathode array produced on the cathode electrode strip. The electron source array structure is produced by adopting a method combining a film micro-processing technology and a self-assembly growth technology. In the method, a nano-wire cold cathode is made by adopting a direct oxidation method without catalyst. In addition, a covering layer is produced on the cathode for protecting a source material required for the growth of nano-wires and limiting the growth of the nano-wires in a region close to the grid electrode. The electron source array structure adopts the nano-wires as the cold cathode, has simple production method and technology as well as high controllability, and can be applied to panel display devices of field emission.

Description

technical field [0001] The present invention relates to a structure of a field emission electron source array and a manufacturing method thereof, in particular to a structure of an electron source array using metal oxide nanowires as a cold cathode material and a manufacturing method thereof. Background technique [0002] Cold cathode electron source arrays are widely used in field emission displays, X-ray sources and microwave devices. So far, the researched cold cathode electron source arrays mainly use cold cathodes of quasi-one-dimensional nanomaterials such as microtips, diamond films and diamond-like films, or carbon nanotubes. [0003] The cold cathode electron source using micro-tips has reached a high level in terms of performance, and products have appeared (S.Itoh et al, Journal of the SID 15 / 12, 1057-1064(2007)). However, its manufacturing process requires high-resolution photolithography, the processing and manufacturing conditions are harsh, the cost is high, ...

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Problems solved by technology

At present, only a few reports have realized the fabrication of a nanowire cold cathode electron source integrated with a gate (J.C.She et al, Applied Physics Letters, 88(1), 013112(2006))

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