Alignment system and alignment method for photolithography equipment
An alignment system and lithography equipment technology, applied in the field of alignment systems, can solve the problems of low alignment scanning signal strength and signal-to-noise ratio, large occupied space, phase mismatch, etc., so as to improve energy utilization and improve alignment. Quasi-accuracy, signal-to-noise ratio and the effect of increased intensity
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[0036] The alignment system and alignment method for lithographic equipment proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
[0037] Please refer to figure 1 , Which is a schematic diagram of the overall layout and working principle structure between the alignment system of the lithography equipment and the lithography equipment provided by an embodiment of the present invention. The lithographic apparatus includes: an illumination system 1 for providing an exposure beam; a mask holder and a mask stage 3 for supporting a reticle 2, on which there is a mask pattern and an alignment mark with a periodic structure RM; used to project the mask pattern on the reticle 2 to the silicon wafer 6 projection optical system 4; used to support the silicon wafer 6 and silicon wafer stage 7, the silicon wafer stage 7 is engraved with fiducial marks FM reference plate 8, silicon wafer 6 with periodi...
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