Double-sided sputtering silvered device of barrel-type quartz crystal

Abstract

The invention relates to a double-sided sputtering silvered device of a barrel-type quartz crystal, comprising a vacuum cavity, a vacuum exhaust unit, a work rest, magnetron sputtering targets, a radio frequency plasma cleaner and an inert gas aerator. The vacuum exhaust unit and the inert gas aerator are respectively connected with the vacuum cavity. The double-sided sputtering silvered device is characterized in that the vacuum cavity is provided with the rotatable work rest which is provided with a turnable substrate frame; the substrate frame is provided with a carrier disc which is provided with a quartz crystal sheet and a mask sheet; and at least two magnetron sputtering targets with film shielding covers are arranged at one side of the work rest, and the radio frequency plasma on-line cleaner is arranged at the other side thereof, wherein one magnetron sputtering target is a transition layer sputtering target and others are electrode layer sputtering targets. As multiple targets for magnetron sputtering, work rest with rotation and revolution and on-line radio frequency plasma cleaner structures are adopted, the quartz substrate can be cleaned in real time and coated with electrode films of multi-layer film structures with chromium and silver on both sides. The invention has good evenness and consistency of the coating film layer, strong bonding force between the film layer and the quartz substrate, large throughput, high production efficiency, compact structure and small volume of the device, and is an ideal quartz crystal silvered device.

Description

technical field [0001] The invention belongs to the technical field of special equipment for sputtering coating, and in particular relates to a double-sided sputtering coated silver device for a cylindrical quartz crystal. Background technique [0002] Quartz crystal oscillator devices are made by plating silver electrode patterns on both surfaces of quartz crystals. Existing silver coating technology is to use vacuum evaporation device or sputtering device to assist with mask fixture to plate silver pattern electrode on quartz wafer. These silver coating equipment have been widely used in industrial production, but generally have the following defects: [0003] 1. The metal layer coated on the quartz surface is a single silver film. Because the structure and thermodynamic properties of silver and quartz do not match, the bonding force between the two is poor, and the silver film is easy to fall off when the quartz crystal oscillator is working; a single silver layer is als...

AI Technical Summary

Problems solved by technology

However, since the target tube of the rotary target cylindrical magnetron sputtering target is in the shape of a tube, and refractory metals such as chromium, tungsten, and molybdenum are made of plates or tubes by powder metallurgy, it is difficult to manufacture long tubes Shaped target

This limits the application of cylindrical targets on coated devices

[0005] 3. Even when multi-target sputtering or multi-crucible evaporation is used to deposit silver, the silver atoms sputtered or evaporated from the silver target will pollute the target of the transition layer, so that the surface of the quartz crystal is first coated with a layer of silver atoms, thereby affecting the bonding force of the film layer

[0006] 4. The loading capacity of the existing evaporation silver device is small, and the production efficiency is too low

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