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Negative light-sensitive resin combination

A technology of photosensitive resin and composition, applied in optics, opto-mechanical equipment, nonlinear optics, etc., can solve the problems of difficult to achieve high transmittance, colorization, volume shrinkage of interlayer insulating film, etc., and achieve UV transmission The effect of excellent rate, excellent chemical resistance, and excellent adhesion

Inactive Publication Date: 2009-11-04
DONGJIN SEMICHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the past, in the case of photosensitive resins, there were problems of coloring after curing, making it difficult to achieve high transmittance required for interlayer insulating films, and shrinking in volume. Therefore, people are eager to improve these problems.

Method used

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  • Negative light-sensitive resin combination
  • Negative light-sensitive resin combination
  • Negative light-sensitive resin combination

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0085] Example 1 (Manufacture of acrylic copolymer)

[0086] 400 parts by weight of isopropanol, 30 parts by weight of methacrylic acid, 30 parts by weight of styrene, 25 parts by weight of glycidyl methacrylate and 15 parts by weight of acrylic acid were placed in a 2L flask (Flask) equipped with a cooler and a stirrer - Mixed solution of 2-hydroxyethyl ester. The above liquid composition was thoroughly mixed at 600 rpm in a mixing vessel, and then 15 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) was added. The above-mentioned polymerization mixed solution was gradually raised to 50°C, and the temperature was maintained for 6 hours to obtain a copolymer solution. 500 ppm of phosphite as a polymerization inhibitor was added to the obtained polymer. The temperature of the flask in which the above-mentioned polymerization was stopped was lowered to 18° C. and left to stand for 1 hour, and the resulting precipitate was obtained and filtered. Propylene glycol mono...

Embodiment 2

[0090] Using 10 parts by weight of [1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime) as a photoinitiator, in addition to Other than that, it implemented by the method similar to the said Example 1, and produced the negative photosensitive resin composition coating solution.

Embodiment 3

[0092] Using 5 parts by weight of [1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime) as a photoinitiator, in addition to Other than that, it implemented by the method similar to the said Example 1, and produced the negative photosensitive resin composition coating solution.

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Abstract

The present invention provides a negative light-sensitive resin combination, having excellent resolving capability, insulativity, flatness, chemical resistance and cementation force, especially having excellent light sensitivity, plastic residue rate and UV permeation rate comparing with the existing light-sensitive resin, thus the combination is suitable to be used in a mode of an organic insulation film. Especially, the invention relates to a negative light-sensitive resin combination containing the following components: (a) acrylic copolymer obtained by the copolymerization of (i) unsaturated carboxyl acid, unsaturated carboxylic acid anhydrides or their mixture, (ii) unsaturated compound containing epoxy group and (iii) ethylene series unsaturated compound; (b) photo-initiator containing [1-[9-ethyl group-6-(2-methylbenzene formyl group )-9H-carbazole -3-group]-1-(O-acetyl oxime); (C) polyfunctional monomer containing olefinic bond type unsaturated linkage; (d) silicon series compound containing epoxy group or amido; and (e) dissolvent.

Description

technical field [0001] The present invention relates to a negative-type photosensitive resin composition, and more specifically, the present invention relates to a negative-type photosensitive resin composition that is excellent in resolution, insulating properties, flatness, chemical resistance, and adhesive force In particular, compared with conventional photosensitive resins, when forming organic insulating films of high-aperture liquid crystal display elements and reflective liquid crystal display elements, the sensitivity, residual film ratio and UV (ultraviolet) transmittance are remarkably excellent, so It is suitable for use in the form of an organic insulating film. Background technique [0002] In a TFT-type liquid crystal display element and an integrated circuit element, an organic insulating film is used in order to insulate wirings arranged between layers. The structure of a TFT type high aperture ratio liquid crystal display element using an organic insulatin...

Claims

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Application Information

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IPC IPC(8): G03F7/038H01L21/84G02F1/1368
CPCC07C59/285C08G77/16G03F7/0045G03F7/027G03F7/032G03F7/033G03F7/0382G03F7/0388
Inventor 金柄郁尹赫敏金东明崔相角丘冀赫吕泰勋尹柱豹申洪大崔守延金珍善李相勋
Owner DONGJIN SEMICHEM CO LTD
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