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Color photoresist for color filter

A color photoresist, monomer technology, applied in the fields of filters, optics, optomechanical equipment, etc., can solve the problems of inability to meet production requirements, reduction, and decline in curing performance in exposure areas.

Inactive Publication Date: 2009-12-30
SUZHOU TIANLILAN ENVIRONMENTAL PROTECTION TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, in recent years, as the color density and optical density of color filters are required to be further improved, the concentration of coloring materials in color photoresists tends to increase.
With the increase of the amount of colored pigments, the amount of other functional components in the color photoresist will be relatively reduced, resulting in a decrease in film performance, such as photosensitive performance, developing performance, mechanical strength of the film, etc. At the same time, due to the pigment itself Absorbs ultraviolet light. If conventional photosensitive monomers (multifunctional monomers containing at least 2 unsaturated functional groups) are used, the curing performance of the exposed area will be significantly reduced, which cannot meet the production requirements.

Method used

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  • Color photoresist for color filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0098] Embodiment one: the synthesis 1 of alkali-soluble resin,

[0099] Add 300 grams of cyclohexanone into the three-necked flask, add the following raw materials in proportion, pass nitrogen into the reaction system, repeat 3 times to ensure that the oxygen is completely discharged, raise the temperature of the reaction system to 80-100 ° C, and react 6-8 After hours, the polymer was precipitated in excess methanol and dried, and the yield was calculated.

[0100] Methacrylic acid 10g

[0101] Styrene 30g

[0102] Methyl methacrylate 30g

[0103] Butyl methacrylate 30g

[0104] Azobisisobutyronitrile 0.1 g

Embodiment 2

[0105] Embodiment two, the synthesis 2 of alkali-soluble resin,

[0106] Add 300 grams of cyclohexanone into the three-necked flask, add the following raw materials in proportion, pass nitrogen into the reaction system, repeat 3 times to ensure that the oxygen is completely discharged, raise the temperature of the reaction system to 80-100 ° C, and react 6-8 After hours, the polymer was precipitated in excess methanol and dried, and the yield was calculated.

[0107] Acrylic 20g

[0108] Styrene 20 g

[0109] Phenyl Acrylate 30g

[0110] Butyl methacrylate 30g

[0111] Azobisisobutyronitrile 0.1 g

Embodiment 3

[0112] Embodiment three, the synthesis 3 of alkali-soluble resin,

[0113] Add 300 grams of cyclohexanone into the three-necked flask, add the following raw materials in proportion, pass nitrogen into the reaction system, repeat 3 times to ensure that the oxygen is completely discharged, raise the temperature of the reaction system to 80-100 ° C, and react 6-8 After hours, the polymer was precipitated in excess methanol and dried, and the yield was calculated.

[0114] Methacrylic acid 10g

[0115] Vinyl Acrylate 30g

[0116] Methyl methacrylate 40g

[0117] Butyl methacrylate 20g

[0118] Azobisisobutyronitrile 0.1 g

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PUM

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Abstract

The invention discloses a color photoresist for a color filter, which comprises paint, a polyfunctional monomer, photoinitiator, dissolvent, alkali soluble resin, as well as an alkali soluble monomer. The polyfunctional monomer comprises at least two unsaturated bonds; and the alkali soluble monomer contains lots of carboxyl groups to increase the alkali solubility of photosensitive resin, greatly improve the unexposed part on a substrate and residual situation on a black matrix and boost the development speed. In addition, the compound contains lots of ethylene unsaturated groups, and the photosensitivity is excellent during exposing, thereby not only enhancing the dying power of the color photoresist, but also improving the performance of films.

Description

technical field [0001] The invention relates to a color photoresist composition. Background technique [0002] The color filter is a key component of liquid crystal display that can be colored, and it is also a key component with the largest cost in the LCD panel. For example, in the material cost of a 15in panel, the color filter accounts for about 24%. Therefore, the technology and quality of color filters have a crucial impact on the display performance of liquid crystal displays. [0003] The color filter is composed of a glass substrate, a black matrix, a color layer, an over coat and an ITO conductive film. Its structure diagram is as follows figure 1 shown. [0004] Glass substrates and photoresists account for most of the material cost in color filters. At present, Corning Corporation of the United States is the main manufacturer of glass substrates, and most of the photoresist raw material technology is in the hands of Japanese manufacturers, such as Fuji Photo...

Claims

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Application Information

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IPC IPC(8): C07C69/533C07C69/54C07C67/08G03F7/027G02B5/20
Inventor 路建美
Owner SUZHOU TIANLILAN ENVIRONMENTAL PROTECTION TECH
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