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Film system of infrared double-waveband antireflection film system and plating method thereof

An anti-reflection film and dual-band technology, which is applied in the field of infrared dual-band anti-reflection film system and its coating, can solve the problems that have not been found, and achieve the effects of uniform thickness, good film bonding force and high transmittance

Inactive Publication Date: 2010-01-06
LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Have not yet found the report of coating 3.7 μ m ~ 4.8 μ m and 7.7 μ m ~ 10.5 μ m infrared dual-band anti-reflection coating the same as the present invention

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] The preferred film structure of the present invention is adopted, that is, a six-layer irregular film structure composed of three film materials. The film system is composed of six layers of films from the inside to the outside, and the innermost first layer is a Ge film. Its optical thickness 895nm, the second layer is ZnS film, its optical thickness is 306nm, the third layer is Ge film, its optical thickness is 422nm, the fourth layer is ZnS film, its optical thickness is 1626nm, the fifth layer is YbF3 film, its The optical thickness is 770nm, and the sixth outermost layer is a ZnS film with an optical thickness of 200nm.

[0021] Adopt plating method of the present invention, concrete technological process is as follows:

[0022] 1. Preparation

[0023] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion source grid;

[0024] 2) Fix the evaporation boat and fill the three membrane materials into the required evaporation boat and crucibl...

Embodiment 2

[0043] Adopt preferred film system structure of the present invention, plating method to make, concrete technological process is as follows:

[0044] 1. Preparation

[0045] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion source grid;

[0046] 2) Fix the evaporation boat and fill the three membrane materials into the required evaporation boat and crucible respectively;

[0047] 3) Replace the quartz crystal plate and the comparison plate of the light controller;

[0048] 4) Write the coating program.

[0049] 2. Clean parts

[0050] 1) Renew the surface of the germanium base optical part with a chromium oxide polishing solution;

[0051] 2) Clean the surface of the parts with absorbent cotton dipped in alcohol-ether mixture;

[0052] 3) Put it into the special fixture and put it into the vacuum chamber as quickly as possible.

[0053] 3. Plating film layer

[0054] Close the vacuum chamber door, start the coating program and start coating...

Embodiment 3

[0065] Adopt preferred film system structure of the present invention, plating method to make, concrete technological process is as follows:

[0066] 1. Preparation

[0067] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion source grid;

[0068] 2) Fix the evaporation boat and fill the three membrane materials into the required evaporation boat and crucible respectively;

[0069] 3) Replace the quartz crystal plate and the comparison plate of the light controller;

[0070] 4) Write the coating program.

[0071] 2. Clean parts

[0072] 1) Renew the surface of the germanium base optical part with a chromium oxide polishing solution;

[0073] 2) Clean the surface of the parts with absorbent cotton dipped in alcohol-ether mixture;

[0074] 3) Put it into the special fixture and put it into the vacuum chamber as quickly as possible.

[0075] 3. Plating film layer

[0076] Close the vacuum chamber door, start the coating program and start coating...

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Abstract

The invention discloses a film system of an infrared double-waveband antireflection film system and a plating method thereof, belonging to a manufacture technology of optical films. The film system comprises six layers of films or eight layers of films, preferably six layers of films which are a Ge film, a ZnS film, a Ge film, a ZnS fillm, a YbF3 film and a ZnS film in sequence from inside to outside, wherein the optical thickness of each layer of films is 895 nm, 306 nm, 422 nm, 1626 nm, 770 nm and 200 nm in sequence from inside to outside. The plating method comprises the following steps: firstly, cleaning a plated part; then roasting a substrate; and plating the Ge film, the ZnS film, and the like in sequence. The transmittivity of the optical part obtained by the film system and the plating method in two waveband ranges of 3.7 microns-4.8 microns and 7.7 microns-10.5 microns is larger than 98 percent, and the adhesion force and the environmental adaptation of the film layers meet the requirements specified by a Chinese military standard GJB2485-95.

Description

technical field [0001] The invention belongs to the thin film manufacturing technology of optical parts, and relates to an infrared dual-band anti-reflection film system and a plating method thereof. Background technique [0002] Conventional optical systems only use optical components with single-band coatings of 3.7 μm to 4.8 μm or 7.7 μm to 10.5 μm. There are many types of materials to choose from, and the coating process is relatively simple, but they cannot be used for optical instruments of common optical path systems. Therefore, the instrument is bulky and heavy, and inconvenient to use. If high transmittance is required for the two bands of 3.7 μm to 4.8 μm and 7.7 μm to 10.5 μm, the design of the film layer and the plating process are more difficult. Optical parts coated with 3.7μm-4.8μm and 7.7μm-10.5μm dual-band coatings are suitable for optical instruments with a common optical path system, which can reduce the volume and weight of the instrument. There is no r...

Claims

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Application Information

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IPC IPC(8): G02B1/11C23C14/24C23C14/06C23C14/14C23C14/18G02B1/115
Inventor 刘凤玉
Owner LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC
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