High durability diazoresin photosensitizer synthesis method

A technology of diazo resin and synthesis method, which is applied in the directions of photosensitive materials, optics, and optomechanical devices for opto-mechanical devices
CN101625527AInactive Publication Date: 2010-01-13合肥安大天辐新材料有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
合肥安大天辐新材料有限公司
Publication Date
2010-01-13
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a high durability diazoresin photosensitizer synthesis method, comprising the following steps: first adding zinc chloride slowly in diphenylamine diazonium salt VRT water solution, obtaining complex salt through suction filtering and drying; then dripping the concentrated sulfuric acid solution dissolved with paraformaldehyde slowly in the concentrated sulfuric acid solution dissolved with complex salt to react for 2-5h while controlling the temperature to -5 to 15 DEG C, obtaining a dark adhesive liquid, namely diazoresin photosensitizer; finally adding the diazoresin photosensitizer in industrial alcohol, stirring and washing, and obtaining the product, namely pure diazoresin photosensitizer though suction filtering; the diazoresin sensitive glue can be prepared by using the diazoresin photosensitizer prepared in the invention while adding different proportions of additives such as polyving alcohol, colorant and the like. After detection, the print resolution is 93%, and the print-resistant time can be up to 30 thousands, which is higher than that of the same type on the market.
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Description

technical field

[0001] The invention belongs to a polymer material production process, in particular to a method for synthesizing a high-endurance diazo resin-type photosensitive agent. Background technique

[0002] Diazo resin photosensitive glue is mainly composed of photosensitizer diazonium salt and film-forming agent polyvinyl alcohol. Compared with dichromate photosensitive glue, diazo resin photosensitive glue has higher resolution, better resolution, and non-toxicity. The most common type of photosensitive glue currently in use.

[0003] Patent CN85104885 discloses a preparation method of photosensitive adhesive for printing, which uses photosensitive group 2-diazo-1-naphthoquinone-5-sulfonyl chloride and film-forming agent—paraben-modified phenolic resin Obtained by esterification reaction. This photosensitive adhesive has good comprehensiveness, such as good chemical bond stability, long shelf life, strong ester sensitivity, fast ink application, no need to lift ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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