High durability diazoresin photosensitizer synthesis method

A technology of diazo resin and synthesis method, which is applied in the directions of photosensitive materials, optics, and optomechanical devices for opto-mechanical devices

Inactive Publication Date: 2010-01-13
合肥安大天辐新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] It is not difficult to find from the above existing technologies that many researchers have synthesized diazo resin-type photosensitive adhesives with different properties by using the photosensitizers developed by themselves and different additives. There is still room for improvement in the number of times and printing resolution

Method used

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  • High durability diazoresin photosensitizer synthesis method
  • High durability diazoresin photosensitizer synthesis method
  • High durability diazoresin photosensitizer synthesis method

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Experimental program
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Embodiment Construction

[0050] Synthetic route of diazo resin type photosensitizer

[0051] Using VRT (diphenylamine diazonium salt) as raw material, and ZnCl 2 The double salt is obtained by reaction, and then the double salt of the diazo compound is reacted with polyoxymethylene in sulfuric acid to obtain a diazo resin-type photosensitive agent.

[0052] Mixed with a certain amount of additives, the diazo photosensitive glue was prepared.

[0053]

[0054] 1. Experimental reagents and raw materials

[0055] Zinc chloride, analytically pure, Chemical Glass Department of Hefei Pharmaceutical Station;

[0056] Industrial alcohol, industrial products, Huainan Chemical Reagent Factory;

[0057] Concentrated sulfuric acid, analytically pure (98%), Shanghai Reagent No. 1 Factory;

[0058] Paraformaldehyde, analytically pure, Shanghai Lingfeng Chemical Reagent Co., Ltd.;

[0059] VRT (blue salt), industrial product, Jiangsu Nantong Xinmingjie Printing Garment Co., Ltd.;

[0060] Sodium dodecyl sul...

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Abstract

The invention discloses a high durability diazoresin photosensitizer synthesis method, comprising the following steps: first adding zinc chloride slowly in diphenylamine diazonium salt VRT water solution, obtaining complex salt through suction filtering and drying; then dripping the concentrated sulfuric acid solution dissolved with paraformaldehyde slowly in the concentrated sulfuric acid solution dissolved with complex salt to react for 2-5h while controlling the temperature to -5 to 15 DEG C, obtaining a dark adhesive liquid, namely diazoresin photosensitizer; finally adding the diazoresin photosensitizer in industrial alcohol, stirring and washing, and obtaining the product, namely pure diazoresin photosensitizer though suction filtering; the diazoresin sensitive glue can be prepared by using the diazoresin photosensitizer prepared in the invention while adding different proportions of additives such as polyving alcohol, colorant and the like. After detection, the print resolution is 93%, and the print-resistant time can be up to 30 thousands, which is higher than that of the same type on the market.

Description

technical field [0001] The invention belongs to a polymer material production process, in particular to a method for synthesizing a high-endurance diazo resin-type photosensitive agent. Background technique [0002] Diazo resin photosensitive glue is mainly composed of photosensitizer diazonium salt and film-forming agent polyvinyl alcohol. Compared with dichromate photosensitive glue, diazo resin photosensitive glue has higher resolution, better resolution, and non-toxicity. The most common type of photosensitive glue currently in use. [0003] Patent CN85104885 discloses a preparation method of photosensitive adhesive for printing, which uses photosensitive group 2-diazo-1-naphthoquinone-5-sulfonyl chloride and film-forming agent—paraben-modified phenolic resin Obtained by esterification reaction. This photosensitive adhesive has good comprehensiveness, such as good chemical bond stability, long shelf life, strong ester sensitivity, fast ink application, no need to lift ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/021G03F7/016
Inventor 杨建军瞿贤超吴庆云张建安吴明元张然王义福崔国庭
Owner 合肥安大天辐新材料有限公司
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