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Nano-structured surface and in situ forming method thereof

A nanostructure, in-situ preparation technology, applied in the field of nanomaterials, can solve the problems of insufficient water contact angle and high cost, and achieve the effects of large water contact angle, convenient and lasting self-cleaning, and excellent hydrophobic performance.

Active Publication Date: 2010-01-20
THE HONG KONG POLYTECHNIC UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The technical problem to be solved by the present invention is to provide a nanostructured surface with a large water contact angle, economical and wear-resistant, and its in-situ preparation method for the above-mentioned defects of insufficient water contact angle and high cost in the prior art

Method used

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  • Nano-structured surface and in situ forming method thereof

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preparation example Construction

[0036] In addition, a method for in-situ preparation of a nanostructured surface is provided, comprising: treating a substrate layer with a mixture containing a silicon precursor, a water-soluble catalyst, and a low surface energy compound to form a treated substrate layer; The processed base layer is cured in an ammonia gas atmosphere, thereby forming a nanostructured surface on the base layer. For example, the treated substrate layer is cured at a temperature between 60°C and 180°C, or preferably at a temperature of 60°C to 120°C.

[0037] Examples of silicon precursors include methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, tetramethoxysilane, tetraethoxysilane, gamma-glycidyloxypropyltrimethoxy Amylsilane, Vinyltriacetoxysilane, Aminopropylsilane, Phenyltrimethoxysilane, and mixtures thereof. While not being bound by theory, it is believed that the silicon precursors are rapidly hydrolyzed in the mixture and that condensation reactions also rapidly o...

Embodiment 1

[0043] Example 1: Production of Cotton Fabrics with Self-Cleaning Surfaces

[0044] Fabrication of nanostructured surfaces on cotton fabric substrates. The substrate is treated with a mixture of silicon-containing precursors, water-soluble catalysts, and low surface energy compounds, and cured with ammonia. The silicon precursor used is methyltrimethoxysilane, the water-soluble catalyst is nitric acid, and the low surface energy compound is fluorine-containing alkoxysiloxane.

[0045] First, 2.5 ml of methyltrimethoxysilane was added to 80 ml of nitric acid solution (pH=2), and stirred for 10 minutes to hydrolyze methyltrimethoxysilane. Dissolve 5 g of Dynasylan F8261 (Sivento Silanes trademark, Degussa Company) in 35 ml of ethanol to prepare a fluorine-containing alkoxysiloxane solution. Then, 20 ml of the fluorine-containing alkoxysiloxane solution was added to the methyltrimethoxysilane solution to form a mixture, which was stirred at room temperature for 10 minutes.

[...

Embodiment 2

[0049] Example 2: Production of cotton fabrics with self-cleaning surfaces

[0050] The nanostructured surface was constructed using the same method as in Example 1, except that no silicon precursor was added to the treatment mixture. The water contact angle on the substrate recorded by the contact angle meter was 122 degrees. The smaller contact angle relative to the surface of Example 1 indicates that the surface has a lower surface energy. Thus, the use of methyltrimethoxysilane as the silicon precursor increases the water contact angle on the substrate relative to a surface prepared without the silicon precursor.

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Abstract

A nano-structured surface includes a substrate layer, and a plurality of immobilized nanoparticles on the substrate layer. The surface has a water contact angle of greater than 145 degrees. An in situ method of fabricating a nano-structured surface includes treating a substrate layer with a mixture that includes a silica precursor, a water-soluble catalyst, and a low-surface-energy compound to form a treated substrate layer, and curing said treated substrate layer in the atmosphere of ammonia to form a nano-structured surface on the substrate layer. The nano-structured surface formed by the method has surface roughness degree and low surface energy thereby having excellent hydrophobicity and larger water contact angle to form a bionic lotus leaf surface. The nano-structured surface can realize self-cleaning function conveniently and durably.

Description

technical field [0001] The invention relates to the field of nanomaterials, more specifically, to a nanostructured surface and an in-situ preparation method thereof. Background technique [0002] Solid substrates with superhydrophobic surfaces can be widely used in industry, and materials with self-cleaning or water-repellent surfaces are of great economic interest. [0003] The water contact angle of conventional hydrophobic materials reaches up to about 120 degrees. One way to create a hydrophobic surface on a solid substrate is to create a rough surface, such as a surface with a fractal structure. Another way to create hydrophobic surfaces on solid substrates is to modify the surface with materials with low surface energy, such as fluoride or silicon-containing compounds. The disadvantage of these techniques is the need for specialized equipment and / or complex process control. [0004] For example, US Patent No. 3,354,022 discloses a water-repellent surface on a hydrop...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B1/00B82B3/00
CPCD06M2200/11B05D3/046D06M13/5135D06M15/693B05D5/08D06M2200/12D06M2200/05D06M2200/10B05D7/06D06M13/513Y10T428/2982
Inventor 忻浩忠刘玉阳卢海峰陈贤琼
Owner THE HONG KONG POLYTECHNIC UNIV
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