Preparation method of silicon nitride coating quartz crucible

A technology of silicon nitride coating and quartz crucible, which is applied in chemical instruments and methods, self-melting liquid pulling method, crystal growth, etc., can solve the problems of complicated preparation process and high production cost, and achieve simple process and low production cost , the effect of wide operating temperature range

Inactive Publication Date: 2010-12-15
SHANDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Silicon nitride-coated quartz crucibles are generally prepared by direct nitriding, plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD) methods on the inner surface of the fired quartz crucible. The preparation process complex and expensive to produce

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0013] 1. Mix monocrystalline silicon silicon powder with a particle size of 0.01 μm and silicon dioxide powder with a particle size of 0.01 μm at a molar ratio of 2:1 to form a vitrified bond.

[0014] 2. Make a silicon nitride ceramic slurry in a ball mill with a particle size of 1 μm silicon nitride powder, vitrified binder, and ethanol in a weight ratio of 30:3:67, and spray it on unfired ceramics after conventional vacuum treatment. A silicon nitride coating with a thickness of 10 μm was formed on the surface of the quartz crucible.

[0015] 3. The coating is dried at a temperature of 80°C.

[0016] 4. Firing in a nitrogen atmosphere at a temperature of 1140° C. for 6 hours to prepare a silicon nitride-coated quartz crucible.

Embodiment 2

[0018] 1. Mix monocrystalline silicon silicon powder with a particle size of 1 μm and silicon dioxide powder with a particle size of 1 μm at a molar ratio of 3:1 to form a vitrified bond.

[0019] 2. Make a silicon nitride ceramic slurry in a ball mill with a particle size of 3 μm silicon nitride powder, ceramic binder, and ethanol at a weight ratio of 39:8:53, and spray it on unfired quartz after vacuum treatment. A silicon nitride coating with a thickness of 50 μm was formed on the surface of the crucible.

[0020] 3. The coating is dried at a temperature of 90°C.

[0021] 4. Firing in a nitrogen atmosphere at a temperature of 1180° C. for 7 hours to prepare a silicon nitride-coated quartz crucible.

Embodiment 3

[0023] 1. Mix monocrystalline silicon silicon powder with a particle size of 2 μm and silicon dioxide powder with a particle size of 2 μm at a molar ratio of 5:1 to form a vitrified bond.

[0024] 2. Make a silicon nitride ceramic slurry in a ball mill with a particle size of 5 μm silicon nitride powder, ceramic binder, and ethanol in a weight ratio of 48:12:40, and spray it on unfired quartz after vacuum treatment. A silicon nitride coating with a thickness of 100 μm was formed on the surface of the crucible.

[0025] 3. The coating is dried at a temperature of 100°C.

[0026] 4. Firing in a nitrogen atmosphere at a temperature of 1300° C. for 8 hours to prepare a silicon nitride-coated quartz crucible.

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Abstract

The invention provides a preparation method of a silicon nitride coating quartz crucible, which is characterized by comprising the steps of ceramic slurry preparation, coating spraying, drying and sintering. The preparation method comprises the flowing detail steps of mixing monocrystalline silicon powder with the granularity of 0.01-3 micrometers and silicon dioxide powder with the granularity of 0.01-3 micrometers to form a ceramic bond; then preparing the ceramic bond, silicon nitride powder with the granularity of 1-5 micrometers and ethanol into in a ball mill to obtain silicon nitride ceramic slurry; carrying out vacuum treatment, and then spraying to the surface of an unfired quartz crucible to form the silicon nitride coating with the thickness of 10-100 micrometers; drying at the temperature of 80-100 DEG C, and then sintering at the temperature of 1140-1300 DEG C in a nitrogen atmosphere for 6-8 hours to prepare the silicon nitride coating quartz crucible. The prepared silicon nitride coating quartz crucible is used for smelting monocrystalline silicon and polycrystalline silicon; in addition, the preparation method the characteristics of has high coating bond strength and low cost because the silicon nitride coating and the quartz crucible are sintered simultaneously.

Description

technical field [0001] The invention relates to a method for preparing a silicon nitride-coated quartz crucible, which belongs to the technical field of ceramic preparation. Background technique [0002] Silicon nitride-coated quartz crucibles are generally prepared by direct nitriding, plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD) methods on the inner surface of the fired quartz crucible. The preparation process Complicated and expensive to produce. Contents of the invention [0003] The object of the present invention is to provide a method for preparing a silicon nitride-coated quartz crucible, which can reduce production costs, improve coating bonding strength, and widen the working temperature range. [0004] The preparation method of the silicon nitride coated quartz crucible according to the present invention comprises preparation of ceramic slurry, coating coating, drying and firing, and the single crystal sil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/22C30B15/10
Inventor 唐竹兴
Owner SHANDONG UNIV OF TECH
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