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Gas-dissolved water supply system

A supply system, dissolved air water technology, applied in the direction of electrical components, water/sewage treatment, neutralized water/sewage treatment, etc., can solve the problems of a large amount, neutralization or sedimentation treatment, sludge and other problems, to achieve high efficiency effect

Inactive Publication Date: 2011-02-09
KURITA WATER INDUSTRIES LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The RCA cleaning method is an effective method for removing metals on the surface of electronic materials, but due to the large amount of high-concentration acid, alkali or hydrogen peroxide used, these liquids are discharged into the waste liquid, and the waste liquid is neutralized or Sedimentation treatment, etc. require a lot of energy and generate a large amount of sludge

Method used

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  • Gas-dissolved water supply system
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  • Gas-dissolved water supply system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] exist figure 1 In the shown dissolved air water supply system, operate under the following conditions.

[0048] Purification device Kurita Industry Co., Ltd. UF membrane module KU-1510HUT

[0049] Purge Gas to Retention Tank Nitrogen

[0050] Storage tank pressure +30mmAq

[0051] Water delivery volume 200L / min

[0052] Supply water 20L / min

[0053] Water delivery pressure 0.2MPa

[0054] Target dissolved oxygen concentration 36mg / L (25°C)

[0055] Injected medicine and concentration (pH) Ammonia pH10

[0056] The oxygen supply source was PSA. Oxygen purity is around 90%. After the water from the purification device 4 is degassed by the degassing membrane module, oxygen is dissolved by dissolving the membrane module. It should be noted that by opening the exhaust valve 9a, the lower end of the dissolution membrane module is released to the atmosphere. The oxygen supply amount is about 1.2 times the necessary amount, that is, 6.05 L (standard state) / min.

[00...

Embodiment 2

[0062] exist figure 2 In the shown dissolved gas water supply system, the water delivery rate from the gas dissolving device 7 is the same as that of Embodiment 1, which is 200 L / min, of which 30 L / min is not used and returned to the storage tank 1, and the remaining 170 L / min It is supplied to the cleaning treatment tank 14, and all the cleaning wastewater is returned to the storage tank 1. Other conditions were the same as in Example 1, and the operation was carried out.

[0063] As a result, the replenishment water rate was 20 L / min, and the oxygen supply rate was 6.05 L / min.

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Abstract

Provided is a gas-dissolved water supply system which can produce gas-dissolved water of high density efficiently and which can circulate and supply the water to a use point. A reserving bath (1) is fed with waste water (or rinsing waste water), after the object to be rinsed was rinsed with water containing a dissolved gas (oxygen), via a pipeline (15), and reserves that waste water, and the supply water is fed via a supply water pipeline (1a). The water of the reserving bath (1) is fed to a purifying device (4) through a forced feed pump (2) and a heat exchanger (3) for keeping the water temperature constant. The water, which is cleared of a foreign substance by the purifying device (4), is fed through a flow meter (5) to a degassing device (6). After this, the gas is dissolved by a gas dissolving device (7), and the water is fed, after chemical was added thereto, to a use point.

Description

technical field [0001] The present invention relates to a dissolved air water supply system, and particularly relates to a dissolved air water supply system suitable for washing water supply systems for silicon wafers for semiconductors, glass substrates for flat panel displays, and the like. Background technique [0002] In order to remove particles, organic substances, metals, etc. from the surface of electronic materials such as silicon substrates for semiconductors, glass substrates for liquid crystals, and quartz substrates for photomasks, the so-called RCA cleaning method using hydrogen peroxide as a substrate is performed. Wet cleaning of concentrated chemical solutions at high temperatures. The RCA cleaning method is an effective method for removing metals on the surface of electronic materials, but due to the large amount of high-concentration acid, alkali or hydrogen peroxide used, these liquids are discharged into the waste liquid, and the waste liquid is neutrali...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08H01L21/304
CPCC02F1/66C02F1/685C02F1/727C02F1/68C02F1/74
Inventor 床岛裕人森田博志龟谷茂二
Owner KURITA WATER INDUSTRIES LTD