Surface treatment method for treating surface of substrate to be highly hydrophobic

A substrate surface, high hydrophobicity technology, applied in nanotechnology for materials and surface science, devices for coating liquids on surfaces, special surfaces, etc., can solve the problem of reduced surface hydrophobicity, technical complexity, low Production efficiency and other issues

Inactive Publication Date: 2011-06-01
TORAY ADVANCED MATERIALS KOREA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As a result, the high hydrophobicity of the surface is significantly reduced over time due to contaminants
[0009] As stated above, the prior art described abo

Method used

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  • Surface treatment method for treating surface of substrate to be highly hydrophobic
  • Surface treatment method for treating surface of substrate to be highly hydrophobic
  • Surface treatment method for treating surface of substrate to be highly hydrophobic

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Embodiment

[0047] A silicon wafer (silicon wafer, 5 cm x 5 cm) was used as a substrate for highly hydrophobic surface treatment. Place the chip in piranha solution (H 2 SO 4 / H 2 o 2 =70 / 30v / v) for about 30 minutes to remove the pollutants on the surface and activate the hydroxyl groups, then take it out, rinse it with deionized water, and then blow it dry with nitrogen. The two organosilanes used in this example were CF 3 (CF 2 ) 10 (CH 2 ) 2 SiCl 3 (FTCS) and CH 3 (CH 2 ) 9 SiCl 3 (DTCS). Put 200 μl of the two organosilanes into 3 g of mineral oil and stir well, then put the mixture in a desiccator, and remove air bubbles in the solution while using a vacuum pump to maintain the pressure inside the desiccator at 10 mTorr . If the chemical vapor deposition is carried out directly without prior removal of the bubbles, the pressure drops while the bubbles boil suddenly and the rapid, irregular and non-uniform evaporation of the organosilane molecules may adversely affect th...

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Abstract

The present invention relates to a surface treatment method for treating the surface of a substrate to be highly hydrophobic for imparting a high hydrophobicity to the substrate, and more specifically, to a surface treatment method for treating the surface of a substrate to be highly hydrophobic, wherein a highly hydrophobic lotus effect is simulated so as to be materialized on a coating by usingtwo kinds of organosilane molecules having a low surface energy and showing the difference in height in case of coating through a self-phase separation during the coating of the organosilane molecules and the surface roughness due to the difference in height of domains and matrixes thereof. The surface treatment method for treating the surface of a substrate to be highly hydrophobic according to the present invention makes the surface of a substrate show a high hydrophobicity by combining to the substrate, wherein a mixed self-assembled monolayer is formed through chemical vapor deposition byusing an organosilane having a CF3 group as a functional group and an organosilane of which the carbon chain is shorter than that of the organosilane and having a CH3 group as a functional group, thereby obtaining a highly hydrophobic surface.

Description

technical field [0001] The present invention relates to a method for modifying the surface of a substrate to be highly hydrophobic in order to impart high hydrophobicity to the substrate. More specifically, the present method exploits the spontaneous phase separation of two different organosilane molecules with low surface energies but different chain lengths during substrate modification. The domain structure and the matrix structure are formed by phase-separated long and short low-surface-energy organosilane molecules, respectively, and the surface roughness caused by the height difference between the two can mimic the superhydrophobicity of the lotus leaf effect. In this way, the method enables the substrate to be rendered highly hydrophobic. Background technique [0002] Today, hydrophobicity (or having low surface energy) of a given surface is a necessary property of the surface, if possible. If the surface of interest is not in a special environment with zero humidit...

Claims

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Application Information

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IPC IPC(8): C23C16/18H01L21/205
CPCB05D1/185B82Y30/00B05D5/083B05D1/60C23C16/22C23C16/56
Inventor 崔城焕文基祯全海尚
Owner TORAY ADVANCED MATERIALS KOREA
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